Charged particle beam irradiation system

• US 7,875,868 B2
• Filed: 12/17/2008
• Issued: 01/25/2011
• Est. Priority Date: 12/21/2007
• Status: Active Grant

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Nakayama, Takahide, Moriyama, Kunio, Nishiuchi, Hideaki
• Primary Examiner(s): NGUYEN, KIET TUAN
• Application Number:
  US12/336,592
• Publication Number:
  US 20090184263A1
• Time in Patent Office: 769 Days
• Field of Search: 250/492.3, 250/398
• US Class Current: 250/492.3
• CPC Class Codes: A61N 2005/1087 Ions; Protons
• CPC Class Codes: A61N 5/1077 Beam delivery systems
• CPC Class Codes: H05H 2007/046 for beam deflection
• CPC Class Codes: H05H 7/04 Magnet systems , e.g. undulators, wigglers free-electron laser H01S3/0903; Energisation thereof

Abstract

A charged particle beam irradiation system comprises a high-speed steerer (beam dump device) 100 disposed in a course of a beam transport line 4 through which an ion beam is extracted from a charged-particle beam generator 1. The beam dump device 100 is provided with dose monitoring devices 105, 106 for measuring a dose of an ion beam applied to a beam dump 104 so that the intensity of the ion beam can be measured without transporting the ion beam to irradiation nozzles 15A through 15D. Thus, the system is capable of adjusting the intensity of an ion beam extracted from a synchrotron without operating each component of a beam transport line, and an irradiation nozzle.

Claims

1. A charged particle beam irradiation system comprising:

a charged particle beam generator for accelerating and extracting a charged particle beam;

a beam transport line for transporting the charged particle beam extracted from the charged particle beam generator, said beam transport line being connected to the charged particle beam generator; and

at least one irradiation nozzle for irradiating an affected part of a patient with the charged particle beam;

wherein

said charged particle beam irradiation system further comprises;

a beam dump device including;

a steering magnet that is disposed on the beam transport line; and

a beam dump that is disposed on a beam path branching from the steering magnet, said beam dump device performing the excitation control of the steering magnet such that from among charged particle beams extracted from the charged particle beam generator, a charged particle beam which is not to be transported to the irradiation nozzle is applied to the beam dump; and

a dose monitoring device disposed in the beam dump device for measuring the dose of the charged particle beam applied to the beam dump.

2. The charged particle beam irradiation system according to claim 1, further comprising an irradiation control device for storing and managing the dose of a charged particle beam measured by the dose monitoring device.

3. The charged particle beam irradiation system according to claim 1, wherein:

said charged particle beam generator includes;

a synchrotron;

a radiofrequency-wave applicator located in the synchrotron for applying an radiofrequency wave to a charged particle beam orbiting in the synchrotron; and

a voltage regulator for controlling a radiofrequency voltage to be supplied to the radiofrequency-wave applicator on the basis of a predetermined gain pattern of the radiofrequency voltage and for controlling the intensity of a charged particle beam extracted from the synchrotron to the beam transport line; and

said dose monitoring device measures the dose of a charged particle beam which is not to be transported to the irradiation nozzle, from among charged particle beams extracted from the synchrotron.

4. The charged particle beam irradiation system according to claim 3, further comprising a voltage gain pattern creation device for creating a voltage gain pattern to be set for the voltage regulator by use of a measured value by the dose monitoring device.

5. The charged particle beam irradiation system according to claim 4, wherein

said voltage gain pattern creation device includes:

first means for setting a beforehand-prepared, temporary voltage gain pattern for the voltage regulator when the temporary voltage gain pattern is input;

second means for operating the voltage regulator on the basis of the temporary voltage gain pattern when an instruction to start beam extraction from the synchrotron is given, for controlling the steering magnet so that a charged particle beam extracted from the synchrotron at the time of the operation is applied to the beam dump, and for measuring the dose of the charged particle beam by use of the dose monitoring device;

third means for displaying the dose of the charged particle beam measured by the dose monitoring device; and

fourth means for adjusting the temporary voltage gain pattern when instructed to do so and then setting the adjusted voltage gain pattern for the voltage regulator.

6. The charged particle beam irradiation system according to claim 3, further comprising:

a first control unit for controlling the start and stop of charged particle beam extraction from the synchrotron;

a second control unit for controlling the excitation of the steering magnet in synchronization with the start and stop of the charged particle beam extraction from the synchrotron and for applying to the beam dump a leaking beam occurring when the charged particle beam extraction is stopped to measure the dose of the leaking beam by use of the dose monitoring device; and

an irradiation control device for managing the dose of the leaking beam measured by the dose monitoring device.

7. The charged particle beam irradiation system according to claim 3, further comprising:

a first control unit for controlling the start and stop of charged particle beam extraction from the synchrotron;

a second control unit for controlling the excitation of the steering magnet in synchronization with the start and stop of the charged particle beam extraction from the synchrotron and for applying to the beam dump a leaking beam occurring when the charged particle beam extraction is stopped to measure the dose of the leaking beam by use of the dose monitoring device; and

a voltage gain pattern correction unit for correcting, on the basis of the dose of the leaking beam measured by the dose monitoring device, the gain pattern of the radiofrequency voltage set for the voltage regulator.

8. The charged particle beam irradiation system according to claim 3, further comprising:

a third control unit for extracting, as an unnecessary beam, part of charged particle beams accumulated in the synchrotron before beam extraction control is started during an extraction control period in an operation cycle of the synchrotron and for controlling simultaneously the excitation of the steering magnet so that the unnecessary beam extracted from the synchrotron is applied to the beam dump to measure the dose of the unnecessary beam by use of the dose monitoring device; and

an irradiation control device for managing the dose of the unnecessary beam measured by the dose monitoring device.

9. The charged particle beam irradiation system according to claim 3, further comprising:

a third control unit for extracting, as an unnecessary beam, part of charged particle beams accumulated in the synchrotron before beam extraction control is started during an extraction control period in an operation cycle of the synchrotron and for controlling simultaneously the excitation of the steering magnet so that the unnecessary beam extracted from the synchrotron is applied to the beam dump to measure the dose of the unnecessary beam by use of the dose monitoring device; and

a voltage gain pattern correction unit for correcting, on the basis of the dose of the unnecessary beam measured by the dose monitoring device, the gain pattern of the radiofrequency voltage set for the voltage regulator.