Systems and methods for creating inspection recipes
First Claim
1. A computer-implemented method for creating an inspection recipe, comprising:
- acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process; and
creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed, wherein the first and second designs are different, wherein the inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process, wherein said creating comprises creating a context map for the second design using the first design and the one or more characteristics of the output and creating the inspection recipe using the context map such that different sensitivity thresholds for de ect detection are applied to output acquired for at least two different contexts in the second design, and wherein said creating the inspection recipe is performed using a computer system.
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Accused Products
Abstract
Systems and methods for creating inspection recipes are provided. One computer-implemented method for creating an inspection recipe includes acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process. The method also includes creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed. The first and second designs are different. The inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process.
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Citations
20 Claims
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1. A computer-implemented method for creating an inspection recipe, comprising:
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acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process; and creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed, wherein the first and second designs are different, wherein the inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process, wherein said creating comprises creating a context map for the second design using the first design and the one or more characteristics of the output and creating the inspection recipe using the context map such that different sensitivity thresholds for de ect detection are applied to output acquired for at least two different contexts in the second design, and wherein said creating the inspection recipe is performed using a computer system. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A carrier medium, comprising program instructions executable on a computer system for performing a computer-implemented method for creating an inspection recipe, wherein the carrier medium is a storage medium, and wherein the computer-implemented method comprises:
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acquiring a first design and one or more characteristics of output of an inspection system for a wafer on which the first design is printed using a manufacturing process; and creating an inspection recipe for a second design using the first design and the one or more characteristics of the output acquired for the wafer on which the first design is printed, wherein the first and second designs are different, wherein the inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process, and wherein said creating comprises creating a context map for the second design using the first design and the one or more characteristics of the output and creating the inspection recipe using the context map such that different sensitivity thresholds for defect detection are applied to output acquired for at least two different contexts in the second design.
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20. A system configured to create an inspection recipe, comprising:
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an inspection system configured to acquire output for a wafer on which a first design is printed using a manufacturing process; and a computer system configured to create an inspection recipe for a second design using the first design and one or more characteristics of the output acquired for the wafer on which the first design is printed, wherein the first and second designs are different, wherein the inspection recipe will be used for inspecting wafers after the second design is printed on the wafers using the manufacturing process, the one or more characteristics of the output and creating the inspection recipe using the context map such that different sensitivity thresholds for defect detection are applied to output acquired for at least two different contexts in the second design.
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Specification