Optical integrator for an illumination system of a microlithographic projection exposure apparatus
First Claim
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1. An optical integrator, comprising:
- a) a first array of elongated convexly curved first microlenses that are arranged side by side in a first plane and have first vertex lines; and
b) a second array of elongated convexly curved second microlenses that are arranged side by side in a second plane and have second vertex lines,wherein;
at least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines or portions thereof; and
the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus.
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Abstract
The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.
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Citations
20 Claims
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1. An optical integrator, comprising:
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a) a first array of elongated convexly curved first microlenses that are arranged side by side in a first plane and have first vertex lines; and b) a second array of elongated convexly curved second microlenses that are arranged side by side in a second plane and have second vertex lines, wherein; at least one second vertex line or a portion thereof does not coincide, in a projection along an optical axis of the optical integrator, with any one of the first vertex lines or portions thereof; and the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15)
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16. An optical integrator, comprising:
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a) a first array of elongated first microlenses that are arranged side by side in a first plane and have first vertex lines; and b) a second array of elongated second microlenses that are arranged side by side in a second plane and have second vertex lines, wherein at least one second vertex line forms a zigzag or serpentine line, and the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus.
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17. An optical integrator, comprising:
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a) a first array of elongated first microlenses that are arranged side by side in a first plane; and b) a second array of elongated second microlenses that are arranged side by side in a second plane, wherein at least one second microlens has a curved surface profile which varies along a longitudinal axis of the at least one second microlens, and the optical integrator is configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. - View Dependent Claims (18, 19, 20)
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Specification