×

Planarization of a layer over a cavity

  • US 7,884,021 B2
  • Filed: 02/27/2007
  • Issued: 02/08/2011
  • Est. Priority Date: 02/27/2007
  • Status: Active Grant
First Claim
Patent Images

1. A method for fabricating a micro structure, comprising:

  • disposing a sacrificial material in a recess formed in a lower layer;

    forming a layer of compensatory material on the sacrificial material in the recess, wherein the compensatory material is higher than the upper surface of the lower layer;

    removing a first portion of the compensatory material using isotropic etching to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface is substantially co-planar with the upper surface of the lower layer; and

    forming an upper layer on the lower layer and the substantially flat surfaceremoving the sacrificial material and a second portion of the compensatory material on the sacrificial material to form a cavity under the upper layer.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×