Planarization of a layer over a cavity
First Claim
Patent Images
1. A method for fabricating a micro structure, comprising:
- disposing a sacrificial material in a recess formed in a lower layer;
forming a layer of compensatory material on the sacrificial material in the recess, wherein the compensatory material is higher than the upper surface of the lower layer;
removing a first portion of the compensatory material using isotropic etching to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface is substantially co-planar with the upper surface of the lower layer; and
forming an upper layer on the lower layer and the substantially flat surfaceremoving the sacrificial material and a second portion of the compensatory material on the sacrificial material to form a cavity under the upper layer.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for fabricating a micro structure includes disposing a sacrificial material in a recess formed in a lower layer and forming a layer of compensatory material on the sacrificial material in the recess. The compensatory material is higher than the upper surface of the lower layer. A first portion of the compensatory material is removed to form a substantially flat surface on the sacrificial material. The substantially flat surface is substantially co-planar with the upper surface of the lower layer. An upper layer is formed on the lower layer and the substantially flat surface.
-
Citations
21 Claims
-
1. A method for fabricating a micro structure, comprising:
-
disposing a sacrificial material in a recess formed in a lower layer; forming a layer of compensatory material on the sacrificial material in the recess, wherein the compensatory material is higher than the upper surface of the lower layer; removing a first portion of the compensatory material using isotropic etching to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface is substantially co-planar with the upper surface of the lower layer; and forming an upper layer on the lower layer and the substantially flat surface removing the sacrificial material and a second portion of the compensatory material on the sacrificial material to form a cavity under the upper layer.
-
-
2. A method for fabricating a micro structure, comprising:
-
disposing a sacrificial material in a recess formed in a lower layer; forming a photo-resist layer on the sacrificial material in the recess and the lower layer; removing a first portion of the photo-resist layer on the lower layer and the sacrificial material to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface is substantially co-planar with the upper surface of the lower layer; and forming an upper layer on the lower layer and the substantially flat surface. - View Dependent Claims (3, 4, 5, 6, 7, 8)
-
-
9. A method for fabricating a mirror plate over a substrate, comprising:
-
forming a hinge support post on the substrate; forming a hinge connection post on the hinge support post and a hinge layer connected to the hinge connection post simultaneously; forming a spacer layer on the hinge layer, wherein the spacer layer comprises a hole over the hinge connection post; disposing a first sacrificial material in the hole in the spacer layer; forming a layer of compensatory material on the first sacrificial material, wherein the compensatory material is higher than the upper surface of the spacer layer; removing a first portion of the compensatory material using isotropic etching to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface is substantially co-planar with the upper surface of the spacer layer; forming a reflective layer over the hinge layer and the substantially flat surface; and selectively removing portions of the reflective layer and the hinge layer to form the mirror plate and a hinge component that is connected to the hinge connection post and the hinge layer, wherein the mirror plate is configured to tilt around the hinge component. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17, 18)
-
-
19. A method for fabricating a mirror plate over a substrate, comprising:
-
forming a hinge support post on the substrate; forming a hinge connection post on the hinge support post and a hinge layer connected to the hinge connection post; forming a spacer layer on the hinge layer, wherein the spacer layer comprises a hole over the hinge connection post; disposing a first sacrificial material in the hole in the spacer layer; forming a photo-resist layer on the first sacrificial material and the spacer layer; removing a first portion of the photo-resist layer on the spacer layer and the sacrificial material to form a substantially flat surface on the sacrificial material, wherein the substantially flat surface has substantially the same height as the upper surface of the spacer layer; forming a reflective layer over the hinge layer and the substantially flat surface; and selectively removing portions of the reflective layer and the hinge layer to form the mirror plate and a hinge component that is connected to the hinge connection post and the hinge layer, wherein the mirror plate is configured to tilt around the hinge component. - View Dependent Claims (20, 21)
-
Specification