Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method
First Claim
1. A photomask comprising a mask pattern provided on a transparent substrate having a transparent property against exposing light,wherein said mask pattern includes a light-shielding portion and a semi-light-shielding portion,a transparent portion having a transparent property against the exposing light and surrounding said mask pattern is provided on said transparent substrate, andsaid semi-light-shielding portion is provided in at least a part of an outer region of said mask pattern and partially transmits the exposing light in an identical phase to the exposing light passing through said transparent portion.
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Accused Products
Abstract
A mask pattern including a light-shielding portion 101 and a semi-light-shielding portion 102 is provided on a transparent substrate 100 having a transparent property against exposing light so as to be surrounded with a transparent portion 104. The semi-light-shielding portion 102 is disposed in an outer region of the mask pattern and partially transmits the exposing light in an identical phase to the exposing light passing through the transparent portion 104.
10 Citations
36 Claims
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1. A photomask comprising a mask pattern provided on a transparent substrate having a transparent property against exposing light,
wherein said mask pattern includes a light-shielding portion and a semi-light-shielding portion, a transparent portion having a transparent property against the exposing light and surrounding said mask pattern is provided on said transparent substrate, and said semi-light-shielding portion is provided in at least a part of an outer region of said mask pattern and partially transmits the exposing light in an identical phase to the exposing light passing through said transparent portion.
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27. A photomask comprising a mask pattern surrounded with a reflection portion on a substrate,
wherein said mask pattern includes a non-reflection portion and a semi-reflection portion, and said semi-reflection portion is provided in at least a part of an outer region of said mask pattern and partially reflects exposing light in an opposite phase to the exposing light reflected by said reflection portion.
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33. A mask data creation method for a photomask including a mask pattern formed on a transparent substrate having a transparent property against exposing light and a transparent portion of said transparent substrate where said mask pattern is not formed, comprising the steps of:
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(a) creating a pattern corresponding to a desired unexposed region of a resist by irradiating said resist with the exposing light through said photomask; (b) dividing said pattern into a first region having a width not larger than a given value and a second region having a width larger than said given value; (c) providing, in said first region, a phase shifter portion for transmitting the exposing light in an opposite phase to the exposing light passing through said transparent portion; (d) providing a light-shielding portion in said second region; and (e) providing, in an outer region of said second region, a semi-light-shielding portion for partially transmitting the exposing light in an identical phase to the exposing light passing through said transparent portion. - View Dependent Claims (34, 35, 36)
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Specification