Method of forming a layer to enhance ALD nucleation on a substrate
First Claim
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1. A method, comprising:
- obtaining a substrate comprising a patterned feature, the patterned feature comprising a dielectric region and a conductive region;
depositing a PVA solution having a concentration of between 20 and 500 mM with respect to monomer units on the substrate to selectively form a self-aligned monolayer (SAM) on the dielectric region of the substrate to enhance a nucleation process of a first precursor;
introducing the first precursor to the substrate, the precursor to adsorb on the SAM.
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Abstract
A layer to enhance nucleation of a substrate is described, including a method to form the layer, the method including obtaining a substrate comprising a patterned feature comprising a dielectric region and a conductive region, selectively forming a self-aligned monolayer (SAM) on the dielectric region of the substrate to enhance nucleation process of a first precursor, and depositing the first precursor on the substrate, the precursor to adsorb on the SAM.
48 Citations
14 Claims
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1. A method, comprising:
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obtaining a substrate comprising a patterned feature, the patterned feature comprising a dielectric region and a conductive region; depositing a PVA solution having a concentration of between 20 and 500 mM with respect to monomer units on the substrate to selectively form a self-aligned monolayer (SAM) on the dielectric region of the substrate to enhance a nucleation process of a first precursor; introducing the first precursor to the substrate, the precursor to adsorb on the SAM. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method comprising:
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obtaining a substrate comprising a dielectric region and a conductive region; patterning the dielectric regions of the substrate to form a patterned feature; depositing a PVA solution having a concentration of between 20 and 500 mM with respect to monomer units on the substrate to selectively form a self-aligned monolayer (SAM) on the dielectric regions of the substrate and the patterned feature; and performing a reactive pre-clean of the substrate. - View Dependent Claims (11, 12, 13, 14)
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Specification