MEMS display devices and methods of fabricating the same
First Claim
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1. An optical MEMS device, comprising:
- a conductive optical absorber formed over a substrate and patterned to form strip electrodes, wherein the optical absorber serves as the primary conductor in said strip electrodes within optically active areas of the MEMS device;
at least one support structure formed over the optical absorber; and
a conductive deformable layer formed over the at least one support structure and spaced apart from the conductive optical absorber, wherein the deformable layer is electrostatically deflectable towards the optical absorber, and wherein the MEMS device functions as an interferometric modulator.
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Abstract
MEMS devices include materials which are used in LCD or OLED fabrication to facilitate fabrication on the same manufacturing systems. Where possible, the same or similar materials are used for multiple layers in the MEMS device, and use of transparent conductors for partially transparent electrodes can be avoided to minimize the number of materials needed and minimize fabrication costs. Certain layers comprise alloys selected to achieve desired properties. Intermediate treatment of deposited layers during the manufacturing process can be used to provide layers having desired properties.
72 Citations
38 Claims
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1. An optical MEMS device, comprising:
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a conductive optical absorber formed over a substrate and patterned to form strip electrodes, wherein the optical absorber serves as the primary conductor in said strip electrodes within optically active areas of the MEMS device; at least one support structure formed over the optical absorber; and a conductive deformable layer formed over the at least one support structure and spaced apart from the conductive optical absorber, wherein the deformable layer is electrostatically deflectable towards the optical absorber, and wherein the MEMS device functions as an interferometric modulator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of fabricating an optical MEMS device, comprising:
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forming a blackmask absorber layer over a substrate; forming a conductive optical absorber over the substrate after forming the blackmask absorber layer , wherein the blackmask absorber layer comprises the same material as the optical absorber; patterning the conductive optical absorber to form strip electrodes, wherein the optical absorber functions as the primary conductor in said strip electrodes in optically active regions of the MEMS device; forming a sacrificial layer over the optical absorber; forming at least one support structure over the optical absorber; forming a conductive deformable layer over the sacrificial layer and the at least one support structure; and performing a release etch to remove the sacrificial layer, forming a cavity between the deformable layer and the optical absorber. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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35. An optical MEMS device, comprising:
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a conductive optical absorber formed over a substrate and patterned to form strip electrodes, wherein the optical absorber serves as the primary conductor in said strip electrodes within optically active areas of the MEMS device; a blackmask absorber layer, wherein the blackmask absorber comprises the same material as the optical absorber; at least one support structure formed over the black mask absorber layer; and a conductive deformable layer formed over the at least one support structure and spaced apart from the conductive optical absorber, wherein the deformable layer is electrostatically deflectable towards the optical absorber. - View Dependent Claims (36, 37, 38)
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Specification