×

Composition for an etching mask comprising a silicon-containing material

  • US 7,906,180 B2
  • Filed: 08/23/2006
  • Issued: 03/15/2011
  • Est. Priority Date: 02/27/2004
  • Status: Active Grant
First Claim
Patent Images

1. A composition operable for forming a layer on a surface, the composition comprising:

  • a solid hydroxyl-functional silicone T-resin component having the general formula RSiO1.5, wherein R is selected from the group consisting of hydroxyl, methyl, phenyl, propyl, and combinations thereof, the T-resin component having silicon atoms associated therewith;

    a cross-linking component;

    a catalyst component; and

    a solvent component,wherein the catalyst component catalyzes a condensation reaction between the cross-linking component and the silicone T-resin component to form Si—

    O—

    C bonds in a cross-linked polymer material in response to thermal energy, andwherein the silicon atoms of the T-resin component comprise at least 5% by weight of the cross-linked polymer material.

View all claims
  • 11 Assignments
Timeline View
Assignment View
    ×
    ×