Exposure apparatus, exposure method, and method for producing device

• US 7,907,254 B2
• Filed: 07/19/2007
• Issued: 03/15/2011
• Est. Priority Date: 02/26/2003
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Owa, Soichi, Nishii, Yasugumi, Nagasaka, Hiroyuki
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US11/826,943
• Publication Number:
  US 20070263183A1
• Time in Patent Office: 1,335 Days
• Field of Search: 355/30, 355/53, 355/67, 355/77, 250/548
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/708 Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
• CPC Class Codes: G03F 7/7095 Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

Abstract

An exposure apparatus successively exposes a plurality of shot areas on a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which projects the image of the pattern onto the substrate, and a liquid supply mechanism which supplies the liquid from a supply port arranged opposite to the substrate to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system. The liquid supply mechanism continuously supplies the liquid from the supply port during a period in which an exposure process is performed for the plurality of shot areas on the substrate.

Claims

1. An exposure apparatus comprising:

a projection optical system which projects an image of a pattern onto a substrate through a liquid to successively expose a plurality of shot areas on the substrate; and

a liquid supply system which supplies the liquid from a first supply port arranged on one side of a projection area of the projection optical system to form a liquid immersion area on a part of the substrate including the projection area, wherein;

the liquid supply system continuously supplies the liquid from the first supply port during a continuous period in which an exposure process is performed for the plurality of shot areas on the substrate,

the plurality of shot areas includes a first shot area which is exposed while moving the substrate in a first direction and a second shot area which is exposed while moving the substrate in a second direction opposite to the first direction, and

the plurality of shot areas are successively exposed in the continuous period without stopping the liquid supply from the first supply port on the one side of the projection area.

2. The exposure apparatus according to claim 1, wherein the liquid supply system has a second supply port.

3. The exposure apparatus according to claim 2, wherein the second supply port is arranged on the other side of the projection area.

4. A method for producing a device, comprising using the exposure apparatus as defined in claim 1.

14. The exposure apparatus according to claim 1, wherein the first supply port is arranged to be opposed to the substrate.

15. The exposure apparatus according to claim 1, further comprising a liquid recovery system which has a recovery port arranged to be opposed to the substrate and which recovers the liquid supplied from the first supply port of the liquid supply system, wherein the plurality of shot areas are successively exposed in the continuous period without stopping suction from the recovery port.

5. An exposure apparatus comprising:

a projection optical system which projects an image of a pattern onto a substrate through a liquid to successively expose a plurality of shot areas on the substrate;

a liquid supply system which supplies the liquid from a supply port to form a liquid immersion area on a part of the substrate including a projection area of the projection optical system; and

a liquid recovery system which has a recovery port arranged to be opposed to the substrate and which recovers the liquid supplied from the liquid supply system, wherein;

the liquid recovery system continues suction by the recovery port on one side of the projection area during a continuous period in which an exposure process is performed for the plurality of shot areas on the substrate,

the plurality of shot areas includes a first shot area which is exposed while moving the substrate in a first direction and a second shot area which is exposed while moving the substrate in a second direction opposite to the first direction, and

the plurality of shot areas are successively exposed in the continuous period without stopping the suction by the recovery port on the one side of the projection area.

6. The exposure apparatus according to claim 5, wherein the recovery port is arranged to surround the projection area and the plurality of shot areas are successively exposed in the continuous period without stopping the suction by the recovery port on every side around the projection area.

7. A method for producing a device, comprising using the exposure apparatus as defined in claim 5.

8. An exposure method comprising:

supplying a liquid from a first supply port disposed on one side of a projection area of a projection optical system to form a liquid immersion area on a part of a substrate including the projection area; and

successively exposing a plurality of shot areas on the substrate by projecting an image of a pattern through the liquid onto the substrate;

wherein the first supply port continues supplying the liquid during a continuous period in which the plurality of shot areas are successively exposed,

the plurality of shot areas includes a first shot area which is exposed while moving the substrate in a first direction and a second shot area which is exposed while moving the substrate in a second direction opposite to the first direction, and

the plurality of shot areas are successively exposed in the continuous period without stopping the liquid supply from the first supply port on the one side of the projection area.

9. A method for producing a device, comprising using the exposure method as defined in claim 8.

12. The method according to claim 8, further comprising supplying the liquid from a second supply port disposed on the other side of the projection area to form the liquid immersion area,

wherein the second supply port continues supplying the liquid during the continuous period in which the plurality of shot areas are successively exposed, and the plurality of shot areas are successively exposed in the continuous period without stopping the liquid supply from the second supply port on the other side of the projection area.

16. The exposure method according to claim 8, further comprising recovering the liquid supplied from the first supply port, from a recovery port arranged to be opposed to the substrate, wherein the plurality of shot areas are successively exposed in the continuous period without stopping suction from the recovery port.

17. The exposure method according to claim 8, wherein the substrate has a coating which repels the supplied liquid.

18. The exposure method according to claim 17, wherein the coating includes a photosensitive material.

19. The exposure method according claim 8, wherein the substrate is positioned such that the substrate faces the first supply port.

20. The exposure method according to claim 8, wherein a supply amount of the liquid per unit time from the first supply port is changed during the continuous period.

21. The exposure method according to claim 12, wherein a supply amount of the liquid per unit time from the first supply port is the same as a supply amount of the liquid per unit time from the second supply port.

22. The exposure method according to claim 12, wherein a supply amount of the liquid per unit time from the first supply port is different from a supply amount of the liquid per unit time from the second supply port.

10. An exposure method comprising:

supplying a liquid from a supply port to form a liquid immersion area on a part of a substrate including a projection area of a projection optical system;

recovering the liquid supplied from the supply port, from a recovery port arranged opposite to the substrate; and

successively exposing a plurality of shot areas on the substrate by projecting an image of a pattern through the liquid onto the substrate;

wherein the recovery port continues suction on one side of the projection area during a continuous period in which the plurality of shot areas are successively exposed,

the plurality of shot areas includes a first shot area which is exposed while moving the substrate in a first direction and a second shot area which is exposed while moving the substrate in a second direction opposite to the first direction, and

the plurality of shot areas are successively exposed in the continuous period without stopping the suction by the recovery port on the one side of the projection area.

11. A method for producing a device, comprising using the exposure method as defined in claim 10.

13. The method according to claim 10, wherein the recovery port is arranged to surround the projection area, and the plurality of shot areas are successively exposed in the continuous period without stopping the suction by the recovery port on every side around the projection area.

23. The exposure method according to claim 10, wherein the substrate has a coating which repels the supplied liquid.

24. The exposure method according to claim 23, wherein the coating includes a photosensitive material.