Gas purification by adsorption of hydrogen sulfide
First Claim
1. A PSA process for the removal of hydrogen sulfide from a feed gas containing at least hydrogen sulfide as an impurity, said process comprising contacting the feed gas with an adsorbent for hydrogen sulfide, adsorbing hydrogen sulfide from said feed gas on said adsorbent to produce a hydrogen sulfide depleted feed gas, and periodically regenerating said adsorbent by desorption of hydrogen sulfide therefrom under PSA conditions wherein said adsorbent for hydrogen sulfide has a sulfur deposition rate of less than 0.04 wt % S per day H2S exposure when continuously exposed to a 1% H2S dry gas at 20°
- C. for seven (7) days;
wherein the adsorbent comprising a silica gel having an SiO2 content of at least 99.2%.
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Abstract
Hydrogen sulfide is removed from a hydrogen rich gas stream using adsorbents having a low loss of carbon dioxide adsorption capacity upon sulfur loading including high purity silica gels, titania or highly cross-linked, non-chemically reactive resins. The adsorbents may be used to adsorb both carbon dioxide and hydrogen sulfide, or may be used as a guard bed upstream of a separate carbon dioxide adsorbent.
35 Citations
12 Claims
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1. A PSA process for the removal of hydrogen sulfide from a feed gas containing at least hydrogen sulfide as an impurity, said process comprising contacting the feed gas with an adsorbent for hydrogen sulfide, adsorbing hydrogen sulfide from said feed gas on said adsorbent to produce a hydrogen sulfide depleted feed gas, and periodically regenerating said adsorbent by desorption of hydrogen sulfide therefrom under PSA conditions wherein said adsorbent for hydrogen sulfide has a sulfur deposition rate of less than 0.04 wt % S per day H2S exposure when continuously exposed to a 1% H2S dry gas at 20°
- C. for seven (7) days;
wherein the adsorbent comprising a silica gel having an SiO2 content of at least 99.2%. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
- C. for seven (7) days;
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12. A process for the purification of a hydrogen rich feed gas containing at least carbon dioxide and hydrogen sulfide as impurities, comprising contacting the feed gas with a first adsorbent contained in a first adsorbent vessel and thereby removing hydrogen sulfide from said feed gas to form a hydrogen sulfide depleted feed gas and contacting said hydrogen sulfide depleted feed gas with at least a second adsorbent contained in a second adsorbent vessel to remove at least carbon dioxide from said hydrogen sulfide depleted feed gas, and at intervals regenerating said first adsorbent and at different intervals regenerating said second adsorbent, wherein said first adsorbent is silica gel having an SiO2 content of at least 99.2% and has a sulfur deposition rate of less than 0.04 wt % S per day H2S exposure when continuously exposed to a 1% H2S dry gas at 20°
- C. for seven (7) days.
Specification