Antireflection-coated transparent substrate exhibiting neutral color in reflection
First Claim
1. A transparent substrate comprising an antireflection coating made of a thin-film multilayer (A) of dielectric material with alternately high and low refractive indices, wherein the multilayer successively comprises, starting from the surface of the substrate:
- a high-index first layer (1) having a refractive index n1 of between 1.8 and 2.2 and a geometrical thickness e1 of between 10 and 25 nm;
a low-index second layer (2) having a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm;
a high-index third layer (3) having a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 110 and 150 nm; and
a low-index fourth layer (4) having a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm,the algebraic sum of the geometrical thicknesses e3+e1 being between 125 and 160 nm, in that said multilayer (A) does not have a Zr dopant and in that said multilayer is present on at least one of the faces of said substrate, the other face being bare, covered with another coating having another functionality, or covered with another antireflection multilayer (A), wherein the high-index first layer (1), the high-index third layer (3) or both are based on silicon nitride, aluminum nitride, mixed tin/zinc oxide, mixed zinc/titanium oxide, silicon/titanium oxide, or a combination thereof.
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Accused Products
Abstract
Transparent especially glass, substrate (6) having at least on one of its sides an antireflection coating made from a stack (A) of thin dielectric layers of alternating high and low refractive indices, characterized in that the stack comprises, in succession: a high-index first film (1) having a refractive index n1 between 1.8 and 2.3 and a geometrical thickness e1 of between 10 and 25 nm; a low-index second film (2) with a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm; a high-index third film (3) with a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness n3 of between 110 and 150 nm; and a low-index fourth film (4) with a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm, the algebraic sum of the geometrical thickness e3+e1 being between 125 and 160 nm.
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Citations
24 Claims
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1. A transparent substrate comprising an antireflection coating made of a thin-film multilayer (A) of dielectric material with alternately high and low refractive indices, wherein the multilayer successively comprises, starting from the surface of the substrate:
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a high-index first layer (1) having a refractive index n1 of between 1.8 and 2.2 and a geometrical thickness e1 of between 10 and 25 nm; a low-index second layer (2) having a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm; a high-index third layer (3) having a refractive index n3 of between 1.8 and 2.2 and a geometrical thickness e3 of between 110 and 150 nm; and a low-index fourth layer (4) having a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm, the algebraic sum of the geometrical thicknesses e3+e1 being between 125 and 160 nm, in that said multilayer (A) does not have a Zr dopant and in that said multilayer is present on at least one of the faces of said substrate, the other face being bare, covered with another coating having another functionality, or covered with another antireflection multilayer (A), wherein the high-index first layer (1), the high-index third layer (3) or both are based on silicon nitride, aluminum nitride, mixed tin/zinc oxide, mixed zinc/titanium oxide, silicon/titanium oxide, or a combination thereof. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification