Multiple doping level bipolar junctions transistors and method for forming
First Claim
1. A process for forming bipolar junction transistors and metal oxide semiconductor field effect transistors over a substrate, the process comprising:
- forming a first doped tub and a plurality of doped collector sinker regions within the substrate;
forming a second and a third doped tub within the substrate;
forming a triple well region for cooperating with the second and the third doped tubs to electrically isolate the first doped tub from the substrate and forming a first plurality of subcollector regions comprising a first doping level;
forming structures associated with the metal oxide semiconductor field effect transistor;
doping a first subset of the first plurality of subcollector regions to form a second plurality of subcollector regions while doping other regions of the substrate to form a third plurality of subcollector regions, wherein the second plurality of subcollector regions comprise a second doping level and the third plurality of subcollector regions comprise a third doping level; and
doping a second subset of the first plurality of subcollector regions to form a fourth plurality of subcollector regions while doping a subset of the third plurality of subcollector regions to form a fifth plurality of subcollector regions and while doping a subset of the first subset of the first plurality of subcollector regions to form a sixth plurality of subcollector regions, wherein the fourth plurality of subcollector regions comprise a fourth doping level, and wherein the fifth plurality of subcollector regions comprise a fifth doping level, and wherein the sixth plurality of subcollector regions comprise a sixth doping level.
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Abstract
A process for forming bipolar junction transistors having a plurality of different collector doping densities on a semiconductor substrate and an integrated circuit comprising bipolar junction transistors having a plurality of different collector doping densities. A first group of the transistors are formed during formation of a triple well for use in providing triple well isolation for complementary metal oxide semiconductor field effect transistors also formed on the semiconductor substrate. Additional bipolar junction transistors with different collector doping densities are formed during a second doping step after forming a gate stack for the field effect transistors. Implant doping through bipolar transistor emitter windows forms bipolar transistors having different doping densities than the previously formed bipolar transistors. According to one embodiment of the present invention, bipolar junction transistors having six different collector dopant densities (and thus six different breakdown characteristics) are formed.
16 Citations
14 Claims
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1. A process for forming bipolar junction transistors and metal oxide semiconductor field effect transistors over a substrate, the process comprising:
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forming a first doped tub and a plurality of doped collector sinker regions within the substrate; forming a second and a third doped tub within the substrate; forming a triple well region for cooperating with the second and the third doped tubs to electrically isolate the first doped tub from the substrate and forming a first plurality of subcollector regions comprising a first doping level; forming structures associated with the metal oxide semiconductor field effect transistor; doping a first subset of the first plurality of subcollector regions to form a second plurality of subcollector regions while doping other regions of the substrate to form a third plurality of subcollector regions, wherein the second plurality of subcollector regions comprise a second doping level and the third plurality of subcollector regions comprise a third doping level; and doping a second subset of the first plurality of subcollector regions to form a fourth plurality of subcollector regions while doping a subset of the third plurality of subcollector regions to form a fifth plurality of subcollector regions and while doping a subset of the first subset of the first plurality of subcollector regions to form a sixth plurality of subcollector regions, wherein the fourth plurality of subcollector regions comprise a fourth doping level, and wherein the fifth plurality of subcollector regions comprise a fifth doping level, and wherein the sixth plurality of subcollector regions comprise a sixth doping level. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A process for forming bipolar junction transistors in a semiconductor substrate further comprising a metal oxide semiconductor field effect transistor, the process comprising:
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forming a first doped tub and a plurality of doped collector sinker regions within the substrate; forming a second and a third doped tub within the substrate; forming a triple well region for cooperating with the second and the third doped tubs to electrically isolate the first doped tub from the substrate and forming a first plurality of subcollector regions comprising a first doping level; forming structures associated with the metal oxide semiconductor field effect transistor; doping a first subset of the first plurality of subcollector regions to form a second plurality of subcollector regions while doping other regions of the substrate to form a third plurality of subcollector regions, wherein the second plurality of subcollector regions comprise a second doping level and the third plurality of subcollector regions comprise a third doping level; and doping a second subset of the first plurality of subcollector regions to form a fourth plurality of subcollector regions while doping a subset of the third plurality of subcollector regions to form a fifth plurality of subcollector regions and while doping a subset of the first subset of the first plurality of subcollector regions to form a sixth plurality of subcollector regions, wherein the fourth plurality of subcollector regions comprise a fourth doping level, and wherein the fifth plurality of subcollector regions comprise a fifth doping level, and wherein the sixth plurality of subcollector regions comprise a sixth doping level. - View Dependent Claims (9, 10, 11, 12, 13, 14)
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Specification