Lithographic apparatus and device manufacturing method

• US 7,911,586 B2
• Filed: 03/27/2009
• Issued: 03/22/2011
• Est. Priority Date: 02/18/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Gui, Cheng-Qun, De Jager, Pieter Willem Herman
• Primary Examiner(s): Mathews; Alan A
• Application Number:
  US12/412,437
• Publication Number:
  US 20090213353A1
• Time in Patent Office: 725 Days
• Field of Search: 355/53, 355/55, 355/67, 355/69, 355/70, 355/71, 355/77, 359/224, 359/291, 359/619, 359/225.1
• US Class Current: 355/70
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift

Abstract

Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.

Claims

1. An apparatus comprising:

a device configured to receive and pattern a beam of radiation; and

an array of focusing elements comprising at least two focus elements, each being optically associated with a first portion and a second portion of the device;

wherein the first portion of the device receives a first portion of the beam of radiation and the second portion of the device receives a second portion of the beam of radiation, the first portion of the beam of radiation having a different intensity than the second portion of the beam of radiation, wherein the first portion of the device provides its corresponding focus element with the first portion of the beam of radiation and the second portion of the device provides its corresponding focus element with the second portion of the beam of radiation.

2. The apparatus of claim 1, wherein the first and second portions of the device each comprise an array of individually controllable elements.

3. The apparatus of claim 2, wherein the array of individually controllable elements comprises a plurality of individually controllable elements arranged in a square configuration.

4. The apparatus of claim 2, wherein the array of individually controllable elements comprises a programmable mirror array.

5. The apparatus of claim 1, wherein the array of focusing elements comprises more than two focus elements.

6. A method, comprising:

receiving, by a first portion of a device, a first portion of a beam of radiation, and by a second portion of the device, a second portion of the beam of radiation, wherein the first portion of the beam of radiation has a different intensity than the second portion of the beam of radiation;

patterning the first portion of the beam of radiation to generate a first portion of a patterned beam and the second portion of the beam of radiation to generate a second portion of the patterned beam;

focusing, using a first focusing element, the first portion of the patterned beam and, using a second focusing element, the second portion of the patterned beam; and

exposing a substrate with the first and second portions of the patterned beam after the first and second potions of the patterned beam are focused using the first and second focus elements.

7. The method of claim 6, wherein the patterning comprises patterning the beam of radiation with a plurality of individually controllable elements.

8. The method of claim 7, wherein the patterning with the plurality of individually controllable elements comprises patterning the beam of radiation with a programmable mirror array.

9. The method of claim 7, wherein the focusing comprises receiving, at the first focus element, the first portion of the patterned beam and, at the second focus element, the second portion of the patterned beam.