Organic electroluminescent display panel and method for fabricating same

• US 7,918,704 B2
• Filed: 05/23/2006
• Issued: 04/05/2011
• Est. Priority Date: 08/12/2005
• Status: Active Grant

• Current Assignee: AU Optronics Corporation
• Original Assignee: AU Optronics Corporation
• Inventors: Lee, Shi-Hao, Shih, Ming-Chang
• Primary Examiner(s): Won; Bumsuk
• Application Number:
  US11/438,357
• Publication Number:
  US 20070035225A1
• Time in Patent Office: 1,778 Days
• Field of Search: 313498-512, 445/24
• US Class Current: 445/24
• CPC Class Codes: H10K 50/86 Arrangements for improving contrast, e.g. preventing reflection of ambient light
• CPC Class Codes: H10K 59/126 Shielding, e.g. light-blocking means over the TFTs
• CPC Class Codes: H10K 59/8791 Arrangements for improving contrast, e.g. preventing reflection of ambient light

Abstract

An organic electroluminescent display panel comprises a substrate, an anti-reflective layer, a light-shielding layer, a transistor and an organic light emitting diode. A method for fabricating said organic electroluminescent display panel comprises forming the anti-reflective layer on the substrate; forming the light-shielding layer with a first region and a second region on the anti-reflective layer; and then, removing at least part of the light-shielding layer to expose at least part of anti-reflective layer in the first region. After that, the transistor is formed above the light-shielding layer in the second region, and the organic light emitting diode is formed above the anti-reflective layer in the first region.

Claims

1. A method for fabricating an organic electroluminescent display panel on a substrate, comprising:

forming an anti-reflective layer on the substrate;

forming a light-shielding layer on the anti-reflective layer after forming the anti-reflective layer on the substrate, the light-shielding layer having a first region and a second region, wherein the anti-reflective layer and the light-shielding layer are made of the metals belonging to the same group in the periodic table of chemical elements;

removing the light-shielding layer from the first region so as to expose at least part of the anti-reflective layer after forming the light-shielding layer on the anti-reflective layer;

forming a transistor on the light-shielding layer in the second region; and

forming an organic light emitting diode on the anti-reflective layer in the first region after removing the light-shielding layer from the first region.

2. The method of claim 1, wherein forming the anti-reflective layer includes forming the anti-reflective layer on the entire substrate.

3. The method of claim 1, wherein forming the light-shielding layer includes forming a metal layer on the anti-reflective layer.

4. A method for fabricating an organic electroluminescent display panel on a substrate, comprising:

forming an anti-reflective layer on the substrate, wherein the step of forming the anti-reflective layer further includes

forming a metal oxide layer on the substrate, and

forming a metal nitride layer on the metal oxide layer;

forming a light-shielding layer on the anti-reflective layer after forming the anti-reflective layer on the substrate, the light-shielding layer having a first region and a second region;

removing the light-shielding layer from the first region so as to expose at least part of the anti-reflective layer after forming the light-shielding layer on the anti-reflective layer;

forming a transistor on the light-shielding layer in the second region; and

forming an organic light emitting diode on the anti-reflective layer in the first region after removing the light-shielding layer from the first region.

5. The method of claim 4, wherein forming the anti-reflective layer includes forming the anti-reflective layer on the entire substrate.

6. The method of claim 4, wherein the metal oxide layer has a thickness larger than that of the nitride layer.

7. The method of claim 6, wherein removing the light-shielding layer includes etching the light-shielding layer to expose the metal nitride layer.

8. The method of claim 4, wherein forming the light-shielding layer includes forming a metal layer on the anti-reflective layer.

9. A method for fabricating an organic electroluminescent display panel on a substrate, comprising:

forming an anti-reflective layer on the substrate;

forming a light-shielding layer on the anti-reflective layer after forming the anti-reflective layer on the substrate, the light-shielding layer having a first region and a second region, wherein the anti-reflective layer has a thickness that is odd multiples of ¼

wavelength in the range of visible light;

removing the light-shielding layer from the first region so as to expose at least part of the anti-reflective layer after forming the light-shielding layer on the anti-reflective layer;

forming a transistor on the light-shielding layer in the second region; and

forming an organic light emitting diode on the anti-reflective layer in the first region after removing the light-shielding layer from the first region.