Over-passivation process of forming polymer layer over IC chip
First Claim
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1. A method for forming a semiconductor chip, comprising:
- providing a silicon substrate, a first circuit layer over said silicon substrate, a second circuit layer over said silicon substrate and said first circuit layer, a dielectric layer between said first and second circuit layers, and a passivation layer over said silicon substrate, said first and second circuit layers and said dielectric layer, wherein said passivation layer comprises a nitride layer;
forming a metal layer over said passivation layer;
forming a photoresist layer on said metal layer, wherein an opening in said photoresist layer exposes a region of said metal layer;
after said forming said photoresist layer, electroplating a copper layer on said region;
after said electroplating said copper layer, removing said photoresist layer;
after said removing said photoresist layer, removing said metal layer not under said copper layer;
after said removing said metal layer not under said copper layer, forming a first polyimide layer over said copper layer; and
curing said first polyimide layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius.
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Abstract
A method for forming a semiconductor chip or wafer includes following steps. A semiconductor substrate is provided, and then a polymer layer is deposited over the semiconductor substrate, wherein the polymer layer comprises polyimide. The polymer layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius. Alternatively, the temperature profile may comprises a period of time with a temperature higher than 320 degree Celsius, wherein the period of time is shorter than 45 minutes.
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Citations
20 Claims
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1. A method for forming a semiconductor chip, comprising:
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providing a silicon substrate, a first circuit layer over said silicon substrate, a second circuit layer over said silicon substrate and said first circuit layer, a dielectric layer between said first and second circuit layers, and a passivation layer over said silicon substrate, said first and second circuit layers and said dielectric layer, wherein said passivation layer comprises a nitride layer; forming a metal layer over said passivation layer; forming a photoresist layer on said metal layer, wherein an opening in said photoresist layer exposes a region of said metal layer; after said forming said photoresist layer, electroplating a copper layer on said region; after said electroplating said copper layer, removing said photoresist layer; after said removing said photoresist layer, removing said metal layer not under said copper layer; after said removing said metal layer not under said copper layer, forming a first polyimide layer over said copper layer; and curing said first polyimide layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method for forming a semiconductor chip, comprising:
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providing a silicon substrate, a first circuit layer over said silicon substrate, a second circuit layer over said silicon substrate and said first circuit layer, a dielectric layer between said first and second circuit layers, a metal pad over said silicon substrate, and a passivation layer over said silicon substrate, said first and second circuit layers and said dielectric layer, wherein said passivation layer comprises a nitride layer, wherein an opening in said passivation layer is over a contact point of said metal pad, and said contact point is at a bottom of said opening in said passivation layer; forming a metal layer on said contact point and over said passivation layer; forming a photoresist layer on said metal layer, wherein an opening in said photoresist layer exposes a region of said metal layer; after said forming said photoresist layer, electroplating a copper layer on said region; forming a nickel layer on said copper layer; after said forming said nickel layer, removing said photoresist layer; after said removing said photoresist layer, removing said metal layer not under said copper layer; after said removing said metal layer not under said copper layer, forming a polyimide layer over said nickel layer; and curing said polyimide layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius. - View Dependent Claims (13, 14, 15, 16)
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17. A method for forming a semiconductor chip, comprising:
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providing a silicon substrate, a first circuit layer over said silicon substrate, a second circuit layer over said silicon substrate and said first circuit layer, a dielectric layer between said first and second circuit layers, a metal pad over said silicon substrate, and a passivation layer over said silicon substrate, said first and second circuit layers and said dielectric layer, wherein said passivation layer comprises a nitride layer, wherein an opening in said passivation layer is over a contact point of said metal pad, and said contact point is at a bottom of said opening in said passivation layer; forming a metal layer on said contact point and over said passivation layer; forming a photoresist layer on said metal layer, wherein an opening in said photoresist layer exposes a region of said metal layer; after said forming said photoresist layer, electroplating a copper layer on said region; forming a nickel layer on said copper layer; forming a gold layer over said nickel layer; after said forming said gold layer, removing said photoresist layer; after said removing said photoresist layer, removing said metal layer not under said copper layer; after said removing said metal layer not under said copper layer, forming a polyimide layer over said gold layer; and curing said polyimide layer with a temperature profile having a peak temperature between 200 and 320 degrees Celsius. - View Dependent Claims (18, 19, 20)
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Specification