Semiconductor device, and design method, inspection method, and design program therefor
First Claim
1. An inspection method of inspecting a multilayer semiconductor device which includes a plurality of circuit blocks which include individual functions of the semiconductor device and are formed on a semiconductor substrate, the method comprising the step of:
- performing inspection with an electrode of a measurement terminal, wherein the measurement terminal is provided on a wiring line which extends from one of the plurality of circuit blocks which include the individual functions of the semiconductor device, the electrode being formed in an uppermost layer of the semiconductor device, and the measurement terminal including a pad in each remaining layer of the semiconductor device, and pads in each remaining layer of the semiconductor device being electrically connected with each other by contact holes which pass through each insulating film of the semiconductor device.
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Accused Products
Abstract
A design method for automatically determining layout of a multilayer semiconductor device which has circuit blocks formed on a semiconductor substrate and measurement terminals for measuring voltage, logic state, or the like, on wiring lines for connecting the circuit blocks. The method includes the steps of registering measurement terminals as cells in design rules, together with the circuit blocks wherein each measurement terminal has an electrode formed in an uppermost layer of the semiconductor device, and the measurement terminal is connectable to a wiring line for connecting any two of the circuit blocks, which is formed in any layer of the semiconductor device; planar-arranging the measurement terminals and the circuit blocks; and establishing connection of each wiring line, which extends from one of the circuit blocks, via one of the measurement terminals.
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Citations
4 Claims
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1. An inspection method of inspecting a multilayer semiconductor device which includes a plurality of circuit blocks which include individual functions of the semiconductor device and are formed on a semiconductor substrate, the method comprising the step of:
performing inspection with an electrode of a measurement terminal, wherein the measurement terminal is provided on a wiring line which extends from one of the plurality of circuit blocks which include the individual functions of the semiconductor device, the electrode being formed in an uppermost layer of the semiconductor device, and the measurement terminal including a pad in each remaining layer of the semiconductor device, and pads in each remaining layer of the semiconductor device being electrically connected with each other by contact holes which pass through each insulating film of the semiconductor device. - View Dependent Claims (2, 3, 4)
Specification