Measurement apparatus, exposure apparatus, and device manufacturing method

• US 7,924,416 B2
• Filed: 06/21/2006
• Issued: 04/12/2011
• Est. Priority Date: 06/22/2005
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Hikima, Ikuo
• Primary Examiner(s): Nguyen; Hung Henry
• Assistant Examiner(s): WHITESELL GORDON, STEVEN H
• Application Number:
  US11/471,666
• Publication Number:
  US 20070097341A1
• Time in Patent Office: 1,756 Days
• Field of Search: 355/30, 355/53, 355/68, 257/467, 250/208.1, 356/121, 356/218
• US Class Current: 356/218
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70525 Controlling normal operating mode, e.g. matching different apparatus, remote control or prediction of failure
• CPC Class Codes: G03F 7/70558 Dose control, i.e. achievement of a desired dose
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

A substrate stage holds a substrate irradiated with exposure light via a liquid. A measurement apparatus measures information on the exposure light and has a light receiving device detachable from the substrate stage. The light receiving device receives the exposure light while being held in the substrate stage.

Claims

1. A wafer-shaped sensor used in an exposure apparatus that exposes a wafer via a liquid, the wafer-shaped sensor comprising:

a light transmission portion that transmits an exposure light having a wavelength of less than 200 nm;

a receiving portion onto which the exposure light is incident via the liquid and the light transmission portion, wherein the wafer-shaped sensor can be detachably held on a wafer holder which holds the wafer subjected to exposure via the liquid; and

a base portion that surrounds the light transmission portion,

wherein a protection film having a repellency to liquid is formed on an upper surface of the base portion, the protection film extending to an outer periphery of the light transmission portion, and

the light transmission portion is above the receiving portion and extends beyond an outer periphery of the receiving portion.

2. The wafer-shaped sensor according to claim 1, wherein the receiving portion is located in an inner space of a base material of the base portion on which the light transmission portion is provided.

3. The wafer-shaped sensor according to claim 1, further comprising a transmitter that wirelessly transmits a light reception result of the exposure light at the light receiving portion.

4. An exposure method for exposing a wafer via a liquid, comprising:

holding the wafer-shaped sensor according to claim 1 by a wafer stage;

receiving an exposure light via a liquid and a light transmission portion to measure information on the exposure light, the liquid being disposed between the wafer-shaped sensor and an optical member, the wafer-shaped sensor being located by the wafer stage to oppose the optical member, the optical member transmitting the exposure light having a wavelength of less than 200 nm; and

exposing a wafer with the exposure light after the measurement in a state in which the wafer replacing the wafer-shaped sensor is held by the wafer stage.

5. A device manufacturing method using the exposure method according to claim 4.