×

Cleaning member, cleaning method, and device manufacturing method

  • US 7,927,428 B2
  • Filed: 09/07/2007
  • Issued: 04/19/2011
  • Est. Priority Date: 09/08/2006
  • Status: Expired due to Fees
First Claim
Patent Images

1. A cleaning method comprising:

  • holding a cleaning member with a substrate-holding member for holding a substrate while exposure light is irradiated onto the substrate in a photolithography process, without the substrate being held by the substrate-holding member, the cleaning member having substantially the same external shape as the substrate, and an outer diameter that is smaller than an outer diameter of the substrate so that a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate is held by the substrate-holding member; and

    supplying a liquid to a space over the gap for cleaning at least part of the substrate-holding member.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×