Cleaning member, cleaning method, and device manufacturing method
First Claim
1. A cleaning method comprising:
- holding a cleaning member with a substrate-holding member for holding a substrate while exposure light is irradiated onto the substrate in a photolithography process, without the substrate being held by the substrate-holding member, the cleaning member having substantially the same external shape as the substrate, and an outer diameter that is smaller than an outer diameter of the substrate so that a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate is held by the substrate-holding member; and
supplying a liquid to a space over the gap for cleaning at least part of the substrate-holding member.
1 Assignment
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Accused Products
Abstract
A method of cleaning at least a portion of an exposure system'"'"'s substrate-holding member. The method involves using the substrate-holding member to hold a cleaning member having substantially the same external shape as a substrate processed with the exposure system. The outer diameter of the cleaning member is smaller than the outer diameter of the substrate processed with the exposure system, and as a result, when the substrate-holding member holds the cleaning member, a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate-holding member is used to hold a substrate. Liquid is supplied to a space over the gap in order to clean at least a portion of the substrate-holding member.
70 Citations
34 Claims
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1. A cleaning method comprising:
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holding a cleaning member with a substrate-holding member for holding a substrate while exposure light is irradiated onto the substrate in a photolithography process, without the substrate being held by the substrate-holding member, the cleaning member having substantially the same external shape as the substrate, and an outer diameter that is smaller than an outer diameter of the substrate so that a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate is held by the substrate-holding member; and supplying a liquid to a space over the gap for cleaning at least part of the substrate-holding member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A device manufacturing method comprising:
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holding a cleaning member with a substrate-holding member for holding a substrate while exposure light is irradiated onto the substrate in a photolithographic process, without the substrate being held by the substrate-holding member, the cleaning member having substantially the same external shape as the substrate, and an outer diameter that is smaller than an outer diameter of the substrate so that a gap is provided from the outer diameter of the cleaning member to another member which surrounds the substrate when the substrate is held by the substrate-holding member; cleaning at least part of the substrate-holding member by supplying a liquid to a space over the gap; after said cleaning, holding a substrate by use of the substrate-holding member; and exposing the substrate held by the substrate-holding member with exposure light. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34)
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Specification