Selective silicide process
First Claim
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1. A method for selective silicidation, comprising:
- providing a substrate comprising a three-dimensional transistor structure, wherein the structure has one or more exposed vertical silicon regions;
alternately and sequentially contacting the substrate with a metal source precursor and an oxygen source precursor to form a metal oxide film about 1 to 200 nm thick directly over the exposed vertical silicon regions;
reducing the metal oxide film to a metal film; and
annealing the metal film to form a metal silicide film over the exposed vertical silicon regions.
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Abstract
A method of self-aligned silicidation on structures having high aspect ratios involves depositing a metal oxide film using atomic layer deposition (ALD) and converting the metal oxide film to metal film in order to obtain uniform step coverage. The substrate is then annealed such that the metal in regions directly overlying the patterned and exposed silicon reacts with the silicon to form uniform metal silicide at the desired locations.
127 Citations
31 Claims
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1. A method for selective silicidation, comprising:
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providing a substrate comprising a three-dimensional transistor structure, wherein the structure has one or more exposed vertical silicon regions; alternately and sequentially contacting the substrate with a metal source precursor and an oxygen source precursor to form a metal oxide film about 1 to 200 nm thick directly over the exposed vertical silicon regions; reducing the metal oxide film to a metal film; and annealing the metal film to form a metal silicide film over the exposed vertical silicon regions. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method for semiconductor fabrication, comprising:
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depositing a metal oxide film about 1 to about 200 nm thick on a substrate comprising one or more exposed vertical silicon surfaces by atomic layer deposition (ALD); reducing the metal oxide film to a metal film; and annealing the metal film to form a metal silicide film in at least one region wherein the metal film contacts the vertical silicon surfaces. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method for selective silicidation, comprising:
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forming a nickel oxide thin film about 1 to 200 nm thick by at least one cycle of an atomic layer deposition (ALD) process, wherein one cycle comprises; contacting a substrate with a nickel source precursor; contacting the substrate with an oxygen source precursor, wherein the substrate has at least one exposed vertical silicon region; reducing the nickel oxide film to a nickel film; and annealing the nickel film to form a nickel silicide film over the exposed vertical silicon region. - View Dependent Claims (26, 27, 28, 29, 30, 31)
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Specification