Profile of flash memory cells
First Claim
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1. A semiconductor structure comprising:
- a semiconductor substrate;
a tunneling layer on the semiconductor substrate;
a source region adjacent the tunneling layer;
a floating gate on the tunneling layer, wherein the floating gate comprises;
a first edge having an upper portion and a lower portion, wherein the lower portion is recessed from the upper portion;
a blocking layer on the floating gate, wherein the blocking layer has a first edge facing a same direction as the first edge of the floating gate; and
a control gate over the blocking layer, wherein the control gate comprises an edge facing the same direction as the first edge of the floating gate, and wherein the first edge of the blocking layer is recessed from the edge of the control gate.
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Abstract
A semiconductor structure includes a semiconductor substrate; a tunneling layer on the semiconductor substrate; a source region adjacent the tunneling layer; and a floating gate on the tunneling layer. The floating gate comprises a first edge having an upper portion and a lower portion, wherein the lower portion is recessed from the upper portion. The semiconductor structure further includes a blocking layer on the floating gate, wherein the blocking layer has a first edge facing a same direction as the first edge of the floating gate.
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Citations
16 Claims
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1. A semiconductor structure comprising:
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a semiconductor substrate; a tunneling layer on the semiconductor substrate; a source region adjacent the tunneling layer; a floating gate on the tunneling layer, wherein the floating gate comprises; a first edge having an upper portion and a lower portion, wherein the lower portion is recessed from the upper portion; a blocking layer on the floating gate, wherein the blocking layer has a first edge facing a same direction as the first edge of the floating gate; and a control gate over the blocking layer, wherein the control gate comprises an edge facing the same direction as the first edge of the floating gate, and wherein the first edge of the blocking layer is recessed from the edge of the control gate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A semiconductor structure comprising:
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a semiconductor substrate; a first tunneling layer and a second tunneling layer on the semiconductor substrate; a common source region between the first and the second tunneling layers, wherein the common source region is in the semiconductor substrate; a first floating gate on the first tunneling layer, wherein the first floating gate has a first sidewall facing the common source region, and wherein a lower portion of the first sidewall of the first floating gate is recessed from an upper portion; a second floating gate on the second tunneling layer, wherein the second floating gate has a first sidewall facing the common source region, and wherein a lower portion of the first sidewall of the second floating gate is recessed from an upper portion; a first blocking layer over the first floating gate, wherein the first blocking layer has a sidewall facing the common source region; and a first control gate over the first blocking layer, wherein the first control gate has a sidewall facing the common source region, and wherein the sidewall of the first blocking layer is recessed from the sidewall of the first control gate. - View Dependent Claims (10, 11, 12, 13, 14)
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15. A semiconductor structure comprising:
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a semiconductor substrate; a first active region in the semiconductor substrate; a second active region in the semiconductor substrate, wherein the first and the second active regions are parallel and spaced apart by an insulation region; a connecting active region perpendicular to the first and the second active regions and connecting a portion of the first active region to a portion of the second active region; a first tunneling layer on the first active region; a first floating gate on the first tunneling layer, wherein the first floating gate has a first edge facing the connecting active region, and wherein a bottom portion of the first edge is recessed from a top portion of the first edge; a second tunneling layer on the second active region; a second floating gate on the second tunneling layer, wherein the first and the second floating gates are disconnected from each other, and wherein the second floating gate has a second edge facing the connecting active region, and wherein a bottom portion of the second edge is recessed from a top portion of the second edge; a blocking layer extending from over the first floating gate to over the second floating gate; and a control gate layer on the blocking layer, the control gate layer extending from over the first floating gate to over the second floating gate, wherein each of the blocking layer and the control gate layer comprises an edge facing the connecting active region, and wherein the edge of the blocking layer is recessed from the edge of the control gate layer. - View Dependent Claims (16)
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Specification