Plasma processing equipment
First Claim
1. A plasma processing equipment comprising:
- a plasma generation chamber in which a substrate to be processed is housed and plasma is generated;
an antenna arranged in an opening of an upper part of said plasma generation chamber to produce an electromagnetic field generated by a microwave; and
a top plate mounted under said antenna to seal the opening of said plasma generation chamber, whereinsaid top plate comprises a concave and convex configuration having at least one tapered ring-shaped concave portion formed around the center on its lower surface,a top of said tapered ring-shaped concave portion includes a flat portion,said antenna comprises a slot plate in which slots are formed so as to be distributed in a predetermined pattern, andat least one ring-shaped convex portion is formed on the lower surface of the top plate so as to extend in a position corresponding to the predetermined pattern of slots in the slot antenna.
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Accused Products
Abstract
Resonance can be surely provided under any plasma condition in such a manner that an antenna (3) is arranged in an opening of an upper part of a chamber (1) to produce an electromagnetic field generated by a microwave, a top plate (4) for sealing the opening of the chamber (1) is provided under the antenna (3), a ring-shaped ridge (41) is provided on a lower surface of the top plate (4) such that a thickness thereof in a diameter direction is tapered so as to be varied sequentially. Thus, only one kind of top plate has the same effect as a top plate having various thicknesses, so that absorption efficiency to the plasma can be considerably improved and the plasma can be generated stably over a range from a high pressure to a low pressure.
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Citations
13 Claims
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1. A plasma processing equipment comprising:
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a plasma generation chamber in which a substrate to be processed is housed and plasma is generated; an antenna arranged in an opening of an upper part of said plasma generation chamber to produce an electromagnetic field generated by a microwave; and a top plate mounted under said antenna to seal the opening of said plasma generation chamber, wherein said top plate comprises a concave and convex configuration having at least one tapered ring-shaped concave portion formed around the center on its lower surface, a top of said tapered ring-shaped concave portion includes a flat portion, said antenna comprises a slot plate in which slots are formed so as to be distributed in a predetermined pattern, and at least one ring-shaped convex portion is formed on the lower surface of the top plate so as to extend in a position corresponding to the predetermined pattern of slots in the slot antenna. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A plasma processing equipment comprising:
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a plasma generation chamber in which a substrate to be processed is housed and plasma is generated; an antenna arranged in an opening of an upper part of said plasma generation chamber to produce an electromagnetic field generated by a microwave; and a top plate mounted under said antenna to seal the opening of said plasma generation chamber, wherein said top plate comprises a plurality of conical projections formed on a lower surface of said top plate and arranged in the form of a ring, said antenna comprises a slot plate in which slots are formed so as to be distributed in a predetermined pattern, and the conical projections are formed so as to correspond to the slots in the slot antenna. - View Dependent Claims (13)
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Specification