Lithographic apparatus and device manufacturing method

• US 7,932,999 B2
• Filed: 08/07/2006
• Issued: 04/26/2011
• Est. Priority Date: 11/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Jansen, Hans, Mulkens, Johannes Catharinus Hubertus, Donders, Sjoerd Nicolaas Lambertus, Streefkerk, Bob, Loopstra, Erik Roelof, Straaijer, Alexander, Verspay, Jacobus Johannus Leonardus Hendricus, Lof, Joeri, Hoogendam, Christiaan Alexander, Derksen, Antonius Theodorus Anna Maria
• Primary Examiner(s): Kim; Peter B
• Application Number:
  US11/499,780
• Publication Number:
  US 20060268250A1
• Time in Patent Office: 1,723 Days
• Field of Search: 355/55, 355/53, 355/30, 355/63, 355/72, 355/75, 355/77, 250/548, 250/492.2, 359/380
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece
• CPC Class Codes: G03F 7/70916 Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
• CPC Class Codes: G03F 9/7088 Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Abstract

A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.

Claims

1. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and

a shutter configured to isolate the space from the substrate,

wherein the shutter is located between the projection system and the substrate when the shutter isolates the space from the substrate.

2. The apparatus according to claim 1, wherein the shutter is positionable on a side of the liquid supply system opposite the projection system such that liquid can be confined in the liquid supply system and between the projection system and the shutter.

3. The apparatus according to claim 1, wherein the liquid supply system comprises at least one inlet to supply the liquid onto the substrate and at least one outlet to remove the liquid after the liquid has passed under the projection system.

4. The apparatus according to claim 1, wherein the liquid supply system is configured to provide the liquid to a space between a final lens of the projection system and the substrate.

5. The apparatus according to claim 1, wherein the shutter is positioned within the liquid supply system.

6. The apparatus according to claim 1, wherein the shutter is moveable through a channel arranged in the liquid supply system.

7. The apparatus according to claim 1, wherein the shutter includes a plurality of moveable parts.

8. The apparatus according to claim 1, wherein the liquid supply system includes one or more projections that are configured to restrict a position of the shutter relative to the liquid supply system.

9. A lithographic projection apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and

a shutter configured to isolate the space from the substrate or from a space to be occupied by a substrate,

wherein the shutter is releasably attachable to the liquid supply system and wherein the shutter is spaced away from the liquid supply system when attached to the liquid supply system.

10. The apparatus according to claim 9, comprising a magnet, a vacuum outlet, or both, configured to connect the shutter to the liquid supply system.

11. The apparatus according to claim 9, wherein the liquid supply system comprises a gas inlet and a vacuum outlet configured to form a seal between the liquid supply system and the shutter.

12. A lithographic apparatus comprising:

a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;

a substrate table configured to hold a substrate;

a projection system configured to project the patterned beam onto a target portion of the substrate;

a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and

a shutter configured to isolate the space from the substrate or from a space to be occupied by a substrate, wherein the shutter comprises a channel in a surface of the shutter facing the projection system.

13. The apparatus according to claim 12, wherein the channel is less than or equal to 10 micrometers deep.

14. The apparatus according to claim 12, wherein the shutter comprises a plurality of concentric channels.

15. The apparatus according to claim 12, wherein the shutter comprises a plurality of radial channels.

16. The apparatus according to claim 12, wherein the channel includes one or more projections configured to provide mechanical connection of the shutter to the liquid supply system, or to reduce a bending of the shutter, or both.

17. The apparatus according to claim 12, wherein the shutter is located between the projection system and the substrate when the shutter isolates the space from the substrate.