Method and apparatus for observing a specimen
First Claim
1. A method for observing a specimen, comprising the steps of:
- irradiating and scanning a convergent electron beam, from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and obtaining a beam SEM image of the pattern formed on the calibration substrate;
calculating an actual direction of the electron beam irradiated on the surface of the calibration substrate by use of the information about an apparent geometric deformation of the known shape on the SEM image; and
wherein the pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching.
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Abstract
A method and device for observing a specimen, in which a convergent electron beam is irradiated and scanned from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and a beam SEM image of the pattern formed on the calibration substrate is obtained. An actual direction of the electron beam irradiated on the surface of the calibration substrate is calculated by use of the information about an apparent geometric deformation of the known shape on the SEM image, and the actual direction of the electron beam to the desired is adjusted direction by using information of the calculated direction. The pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching.
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Citations
23 Claims
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1. A method for observing a specimen, comprising the steps of:
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irradiating and scanning a convergent electron beam, from a desired direction, on a surface of a calibration substrate on which a pattern with a known shape is formed, and obtaining a beam SEM image of the pattern formed on the calibration substrate; calculating an actual direction of the electron beam irradiated on the surface of the calibration substrate by use of the information about an apparent geometric deformation of the known shape on the SEM image; and wherein the pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 22)
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9. A device for observing a specimen comprising:
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a table which carries a specimen having a calibration substrate; a SEM imager which obtains a SEM image in a desired direction including a vertical or oblique direction relative to a surface of the calibration substrate, and which detects a secondary electron or reflective electron generated from the specimen by irradiation with an electron beam; an image processing unit which processes a SEM image obtained by the SEM imager; a calculator which calculates an actual direction of the electron beam irradiated on the surface of the calibration substrate on which a pattern with a known shape is formed by using information about an apparent geometric deformation of the known shape on the SEM image; and a controller which controls the SEM imager; wherein the pattern with the known shape formed on the calibration substrate has a crystal plane formed by anisotropic chemical etching. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 23)
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17. A device for observing a specimen comprising:
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a table which carries a specimen; a SEM imager which obtains a SEM image of the specimen by irradiating and scanning an electron beam on a surface of the specimen and detecting a secondary electron or reflected electron generated from the specimen; an image processing unit which processes a SEM image obtained by the SEM imager; a display screen which displays the SEM image or an image processed by the image processing unit; a calculator which calculates a direction of the electron beam incident on a surface of a calibration substrate forming at least a part of the specimen and on which a crystal plane pattern is formed; and a controller which controls the SEM images to adjust the direction of the electron beam incident on the surface of the surface of the calibration substrate by using information of the calculated direction. - View Dependent Claims (18, 19, 20, 21)
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Specification