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MEMS devices having support structures

  • US 7,936,031 B2
  • Filed: 07/21/2006
  • Issued: 05/03/2011
  • Est. Priority Date: 07/22/2005
  • Status: Expired due to Fees
First Claim
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1. An electromechanical device formed by a method comprising:

  • providing a substrate;

    depositing an electrode layer over the substrate;

    depositing a sacrificial layer over the electrode layer;

    patterning the sacrificial layer to form apertures;

    forming support structures over the sacrificial layer, wherein the support structures are formed at least partially within the apertures in the sacrificial material, wherein the support structures comprise an inorganic material, wherein an upper surface of each support structure comprises a depression within an interior region of the support structure, and wherein the support structures comprise a substantially horizontal wing portion extending over a substantially flat portion of the sacrificial material; and

    depositing a movable layer over the sacrificial layer and the support structures, wherein a portion of the movable layer extends between at least two of the support structures.

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