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Lithographic apparatus and device manufacturing method

  • US 7,936,443 B2
  • Filed: 05/09/2006
  • Issued: 05/03/2011
  • Est. Priority Date: 05/09/2006
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • a projection system configured to project a patterned beam onto a target portion of a substrate;

    a frame configured to hold said projection system;

    a mount configured to support said projection system on said frame, said mount comprising a piezo-electric actuator configured to apply a force to move said projection system; and

    a sensor configured to measure a position or a time derivative of the position of said frame,wherein said piezo-electric actuator is controlled based on the measured position or the time derivative of said position of said frame.

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