Lithographic apparatus and device manufacturing method

• US 7,936,443 B2
• Filed: 05/09/2006
• Issued: 05/03/2011
• Est. Priority Date: 05/09/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Butler, Hans, Auer, Frank
• Primary Examiner(s): Nguyen; Hung Henry
• Assistant Examiner(s): WHITESELL GORDON, STEVEN H
• Application Number:
  US11/430,181
• Publication Number:
  US 20070263189A1
• Time in Patent Office: 1,820 Days
• Field of Search: 355/53, 355/72, 355/75, 355/55
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation
• CPC Class Codes: H01L 21/0274 Photolithographic processes

Abstract

Data from the piezo-electric sensors in the mounts for the projection system can be used in the control loops for other parts of the lithographic apparatus, for example the mask table, the substrate table or the air mounts for the frame bearing the projection system. Information from, for example, a geophone, which is used to measure the absolute velocity of the frame bearing the projection system, can be used in the control loop for the piezo-electric actuator in the mount for the projection system.

Claims

1. A lithographic apparatus comprising:

a projection system configured to project a patterned beam onto a target portion of a substrate;

a frame configured to hold said projection system;

a mount configured to support said projection system on said frame, said mount comprising a piezo-electric actuator configured to apply a force to move said projection system; and

a sensor configured to measure a position or a time derivative of the position of said frame,

wherein said piezo-electric actuator is controlled based on the measured position or the time derivative of said position of said frame.

2. The lithographic apparatus according to claim 1, wherein said mount further comprises a piezo-electric sensor configured to measure a force between said frame and said projection system.

3. The lithographic apparatus according to claim 2, wherein said piezo-electric sensor is arranged in series with said piezo-electric actuator.

4. The lithographic apparatus according to claim 1, wherein said mount comprises a plurality of the piezo-electric actuators.

5. The lithographic apparatus according to claim 4, wherein said mount further comprises:

a plurality of piezo-electric sensors configured to measure a force between said frame and said projection system, each respective one of the piezo-electric actuators being arranged in series with a corresponding one of the piezo-electric sensors.

6. The lithographic apparatus according to claim 1, wherein said sensor comprises a velocity sensor and wherein said piezo-electric actuator is controlled based on a measured velocity of said frame.

7. The lithographic apparatus according to claim 6, wherein said velocity sensor is a geophone.

8. The lithographic apparatus according to claim 1, wherein said sensor comprises an acceleration sensor and wherein said piezo-electric actuator is controlled based on a measured acceleration of said frame.

9. A device manufacturing method comprising:

projecting a patterned beam of radiation onto a target portion of a substrate using a projection system;

holding said projection system using a frame;

supporting said projection system on said frame using a mount, said mount comprising a piezo-electric actuator constructed to apply a force to move said projection system;

measuring a position or a time derivative of the position of said frame; and

controlling said piezo-electric actuator based on the measured position or the measured time derivative of the position of said frame.