Altering pattern data based on measured optical element characteristics
First Claim
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1. A method, comprising:
- (a) generating pattern data corresponding to features to be formed on a substrate using a patterning device;
(b) measuring, during the patterning of the substrate using the patterning device at least one of aberrations and distortions of a projection system;
(c) feeding back the measured at least one of aberrations and distortions to perform altering of the pattern data;
(d) measuring imperfections in a pupil of an illumination system that provides illumination radiation to the patterning device; and
(e) altering the pattern data based on the illumination system measuring.
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Abstract
A system and method are used to compensate for distortions or aberrations in an image formed in a projection system. Pattern data is generated corresponding to features to be formed on a substrate. At least one of aberrations and distortions of a projection optical system are measured. The pattern data is altered based on the measuring step. The altered pattern data is transmitted to a patterning device to control individually controllable elements coupled to the patterning device. Non uniformities in one or both of a field and pupil of an illumination system can also be measured and used to alter the pattern data.
75 Citations
31 Claims
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1. A method, comprising:
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(a) generating pattern data corresponding to features to be formed on a substrate using a patterning device; (b) measuring, during the patterning of the substrate using the patterning device at least one of aberrations and distortions of a projection system; (c) feeding back the measured at least one of aberrations and distortions to perform altering of the pattern data; (d) measuring imperfections in a pupil of an illumination system that provides illumination radiation to the patterning device; and (e) altering the pattern data based on the illumination system measuring. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A lithographic system, comprising:
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an illumination system configured to process a beam of radiation; a patterning device including a controller and an array of individually controllable elements, the controller being configured to control the array of individually controllable elements based on received pattern data to pattern the beam of radiation; a projection system configured to project the patterned beam onto a target portion of a substrate; a first measuring system configured to measure at least one of aberrations or distortions of the projection system; and a second measuring system configured to measure imperfections in a pupil of the illumination system configured to provide illumination radiation to the patterning device, wherein the controller is configured to use the measured at least one of aberrations or distortions or imperfections to alter the pattern data, and wherein the imperfections comprise a surface or an alignment imperfection. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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31. A method, comprising:
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measuring, during patterning of a substrate, imperfections in a pupil of an illumination system configured to provide radiation to a patterning device that patterns the substrate based on received patterning data; and measuring, during the patterning of the substrate, at least one of aberrations and distortions of a projection system configured to project the patterned beam onto the substrate; feeding back the at least one of aberrations and distortions, and the imperfections to perform altering of the pattern data based on the measuring; and transmitting the altered pattern data to a patterning device to control individually controllable elements coupled to the patterning device.
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Specification