×

E-beam inspection structure for leakage analysis

  • US 7,939,348 B2
  • Filed: 08/28/2007
  • Issued: 05/10/2011
  • Est. Priority Date: 08/28/2007
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of forming a device comprising:

  • providing a test structure on a substrate which detects various types of leakage defects,the test structure capable of quantifying magnitude of leakage based on grey scale;

    differentiating killer leakage defects comprising,forming a first level metal contacting contacts coupled to the test structure;

    performing a voltage contrast (VC) test by scanning the test structure to obtain a VC test result, wherein the VC test is performed prior to forming the first level metal;

    performing an electrical test on the test structure to obtain an electrical test result after forming the first level metal, andcorrelating the electrical test results and VC test results to determine which elements of the test structure are defective;

    determining a solution for the killer defects; and

    fabricating the device on the substrate incorporating the solution.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×