Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
First Claim
1. A photomask for integrated circuit production for development of integrated circuit components, the integrated circuit production using a radiation source that generates a source image, the photomask comprising:
- a substrate with one or more layers disposed thereon;
a source separator element that separates the source image into one or more duplicate source images;
one or more polarizing elements each corresponding to one of the one or more duplicate source images; and
one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source.
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Accused Products
Abstract
A photomask for integrated circuit production for development of integrated circuit components, where the integrated circuit production uses a radiation source that generates a source image, includes a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate source images; one or more polarizing elements each corresponding to one of the one or more duplicate source images; and one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source.
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Citations
17 Claims
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1. A photomask for integrated circuit production for development of integrated circuit components, the integrated circuit production using a radiation source that generates a source image, the photomask comprising:
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a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate source images; one or more polarizing elements each corresponding to one of the one or more duplicate source images; and one or more sensors each corresponding to one of the one or more polarizing elements, the one or more sensors sensing one or more radiation characteristics of the radiation source. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A method of integrated circuit production for development of integrated circuit components, the integrated circuit production using a radiation source that generates a source image, comprising the steps of:
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providing a photomask comprising; a substrate with one or more layers disposed thereon; a source separator element that separates the source image into one or more duplicate source images; one or more polarizing elements each corresponding to one of the one or more duplicate source images; and one or more sensors each corresponding to one of the one or more polarizing components; separating the source image into one or more duplicate source images using the source separator element; polarizing each of the one or more duplicate source images using the one or more polarizing elements; sensing one or more radiation characteristics of the one or more polarized duplicate source images using the one or more sensors; and determining one or more radiation characteristics of the radiation source based on the one or more sensed radiation characteristics of the polarized duplicate source images. - View Dependent Claims (13, 14, 15, 16, 17)
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Specification