Method for manufacturing display device

• US 7,943,287 B2
• Filed: 07/26/2007
• Issued: 05/17/2011
• Est. Priority Date: 07/28/2006
• Status: Expired due to Fees

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Shoji, Hironobu, Arai, Yasuyuki, Tanaka, Koichiro, Yamazaki, Shunpei
• Primary Examiner(s): McPherson; John A.
• Application Number:
  US11/881,232
• Publication Number:
  US 20080182207A1
• Time in Patent Office: 1,391 Days
• Field of Search: None
• US Class Current: 430/319
• CPC Class Codes: H01L 27/124 with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits wiring structures per se H01L23/52
• CPC Class Codes: H01L 27/1288 employing particular masking sequences or specially adapted masks, e.g. half-tone mask
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

An object is to provide a display device that can be manufactured with increased use efficiency of a material by a simplified manufacturing process and a manufacturing technique thereof. A light-absorbing layer is formed, an insulating layer is formed over the light-absorbing layer, the light-absorbing layer and the insulating layer are selectively irradiated with laser light, so that an irradiated region of the light-absorbing layer and an irradiated region of the insulating layer are removed, and accordingly an opening is formed in the light-absorbing layer and the insulating layer, and a conductive film is formed in the opening so as to be in contact with the light-absorbing film. The conductive film is formed in the opening so as to be in contact with the exposed light-absorbing layer, so that the light-absorbing layer and the conductive film are electrically connected to each other with the insulating layer interposed therebetween.

Claims

1. A method for manufacturing a display device comprising:

forming a light-absorbing layer;

forming an insulating layer over the light-absorbing layer;

selectively emitting a laser light to the light-absorbing layer and the insulating layer to remove an irradiated region of the light-absorbing layer and an irradiated region of the insulating layer, so that an opening is formed in the light-absorbing layer and the insulating layer; and

forming a conductive film in the opening so as to be in contact with the light-absorbing layer, and

wherein the light-absorbing layer contains a conductive material.

10. A method for manufacturing a display device according to any one of claims 1 to 5, wherein the insulating layer transmits the laser light.

11. A method for manufacturing a display device according to any one of claims 1 to 5, wherein the display device is one selected from the group consisting of a portable information terminal, a video camera, a cellular phone, a television, and a computer.

12. A method for manufacturing a display device according to any one of claims 1 to 4, wherein the light-absorbing layer contains chromium, tantalum, silver, molybdenum, nickel, titanium, cobalt, copper, or aluminum.

2. A method for manufacturing a display device comprising:

forming a light-absorbing layer;

forming an insulating layer over the light-absorbing layer;

selectively emitting a laser light to the light-absorbing layer and the insulating layer to remove part of an irradiated region of the light-absorbing layer and an irradiated region of the insulating layer, so that an opening is formed in the light-absorbing layer and the insulating layer; and

forming a conductive film in the opening so as to be in contact with the light-absorbing layer, and

wherein the light-absorbing layer contains a conductive material.

3. A method for manufacturing a display device comprising:

forming a conductive layer;

forming a light-absorbing layer over the conductive layer;

forming an insulating layer over the light-absorbing layer;

selectively emitting a laser light to the light-absorbing layer and the insulating layer to remove an irradiated region of the light-absorbing layer and an irradiated region of the insulating layer, so that an opening is formed in the light-absorbing layer and the insulating layer; and

forming a conductive film in the opening so as to be in contact with the light-absorbing layer and the conductive layer, and

wherein the light-absorbing layer contains a conductive material.

4. A method for manufacturing a display device comprising:

forming a conductive layer;

forming a light-absorbing layer over the conductive layer;

forming an insulating layer over the light-absorbing layer;

selectively emitting a laser light to the light-absorbing layer and the insulating layer to remove part of an irradiated region of the light-absorbing layer and an irradiated region of the insulating layer, so that an opening is formed in the light-absorbing layer and the insulating layer; and

forming a conductive film in the opening so as to be in contact with the light-absorbing layer, and

wherein the light-absorbing layer contains a conductive material.

5. A method for manufacturing a display device comprising:

forming a conductive layer;

forming a light-absorbing layer over the conductive layer;

forming an insulating layer over the light-absorbing layer;

selectively emitting a laser light to the light-absorbing layer and the insulating layer to remove part of the conductive layer, an irradiated region of the light-absorbing layer, and an irradiated region of the insulating layer, so that an opening is formed in the conductive layer, the light-absorbing layer, and the insulating layer; and

forming a conductive film in the opening so as to be in contact with the light-absorbing layer and the conductive layer.

6. A method for manufacturing a display device according to claim 5, wherein the light-absorbing layer contains a conductive material.

7. A method for manufacturing a display device according to claim 6, wherein the light-absorbing layer contains chromium, tantalum, silver, molybdenum, nickel, titanium, cobalt, copper, or aluminum.

8. A method for manufacturing a display device according to claim 5, wherein the light-absorbing layer contains a semiconductor material.

9. A method for manufacturing a display device according to claim 8, wherein the light-absorbing layer contains silicon.