Display substrate, display device and method of manufacturing the same
First Claim
1. A flexible display substrate comprising:
- a thin film transistor on the flexible substrate, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer;
a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line;
a first stress absorbing layer below the thin film transistor and the storage capacitor;
a first protection layer on the first stress absorbing layer;
a second stress absorbing layer on the thin film transistor and the storage capacitor;
a second protection layer on the second stress absorbing layer;
a third stress absorbing layer on the pixel electrode;
a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; and
a third protection layer between the second stress absorbing layer and the thin film transistor.
2 Assignments
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Accused Products
Abstract
A flexible display substrate includes: a thin film transistor on the flexible substrate, the thin film transistor including a gate electrode, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; a first stress absorbing layer below the thin film transistor; a first protection layer on the first stress absorbing layer; a second stress absorbing layer on the thin film transistor; a second protection layer on the second stress absorbing layer; and a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode.
10 Citations
14 Claims
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1. A flexible display substrate comprising:
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a thin film transistor on the flexible substrate, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line; a first stress absorbing layer below the thin film transistor and the storage capacitor; a first protection layer on the first stress absorbing layer; a second stress absorbing layer on the thin film transistor and the storage capacitor; a second protection layer on the second stress absorbing layer; a third stress absorbing layer on the pixel electrode; a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; and a third protection layer between the second stress absorbing layer and the thin film transistor. - View Dependent Claims (2, 3)
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4. A method of manufacturing a flexible display substrate comprising:
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forming a first stress absorbing layer on the flexible substrate; forming a first protection layer on the first stress absorbing layer; forming a thin film transistor on the first protection layer, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; forming a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line; forming a second stress absorbing layer on the thin film transistor and the storage capacitor; forming a second protection layer on the second stress absorbing layer; forming a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; and a third protection layer below the second stress absorbing layer and on the thin film transistor and the storage capacitor. - View Dependent Claims (5, 6, 7)
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8. A method of manufacturing an electrophoretic ink flexible display device comprising:
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forming a first stress absorbing layer on a flexible substrate; forming a first protection layer on the first stress absorbing layer; forming a thin film transistor on the first protection layer, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; forming a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line; forming a second stress absorbing layer on the thin film transistor and the storage capacitor; forming a second protection layer on the second stress absorbing layer; forming a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; forming an electrophoretic ink film on the flexible substrate; and a third protection layer below the second stress absorbing layer and on the thin film transistor and the storage capacitor. - View Dependent Claims (9)
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10. A method of manufacturing a flexible liquid crystal display device comprising:
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forming a first stress absorbing layer on a first flexible substrate; forming a first protection layer on the first stress absorbing layer; forming a thin film transistor on the first protection layer, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; forming a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line; forming a second stress absorbing layer on the thin film transistor; forming a second protection layer on the second stress absorbing layer; forming a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; forming a second flexible substrate; forming a liquid crystal layer between the first and second flexible substrates, and a third protection layer below the second stress absorbing layer and on the thin film transistor and the storage capacitor. - View Dependent Claims (11, 12)
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13. A flexible display substrate, comprising:
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a thin film transistor on the flexible substrate, the thin film transistor including a gate electrode extending from a gate line, a gate insulating layer insulating the gate electrode, a channel layer on the gate insulating layer, a source electrode connected with the channel layer, and a drain electrode connected with the channel layer; a storage capacitor on the flexible substrate, the storage capacitor including the gate line, the gate insulating layer and a storage capacitor electrode covering the gate line; a first stress absorbing layer below the thin film transistor and the storage capacitor; a first protection layer on the first stress absorbing layer; a second stress absorbing layer on the thin film transistor and the storage capacitor; a second protection layer on the second stress absorbing layer; and a pixel electrode on the second protection layer, the pixel electrode being connected with the drain electrode via a first contact hole in the second stress absorbing layer and the second protection layer and with the storage capacitor electrode via a second contact hole in the second stress absorbing and the second protection layer; and a third protection layer below the second stress absorbing layer and on the thin film transistor and the storage capacitor. - View Dependent Claims (14)
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Specification