Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- a first beam splitter configured to create a first plurality of spatially coherent radiation beams;
a second beam splitter configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams;
with the first and second beam splitters are diffraction gratings,a phase plate, an attenuator, or both a phase plate and an attenuator, configured to modify the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and
a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern,wherein the phase plate, the attenuator, or both the phase plate and the attenuator are arranged between the second beam splitter and the beam combiner.
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Abstract
A lithographic apparatus includes a first diffraction grating configured to create a first plurality of spatially coherent radiation beams and a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams. The apparatus also includes a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern.
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Citations
21 Claims
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1. A lithographic apparatus comprising:
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a first beam splitter configured to create a first plurality of spatially coherent radiation beams; a second beam splitter configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams;
with the first and second beam splitters are diffraction gratings,a phase plate, an attenuator, or both a phase plate and an attenuator, configured to modify the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and
a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern,wherein the phase plate, the attenuator, or both the phase plate and the attenuator are arranged between the second beam splitter and the beam combiner. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A lithographic apparatus comprising:
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a first diffraction grating configured to create a first plurality of spatially coherent radiation beams; a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams; a radiation transfer device arranged between the first and the second diffraction gratings, the radiation transfer device configured to redirect the portion of the first plurality of spatially coherent radiation beams towards the second diffraction grating such that the first plurality of spatially coherent radiation beams form a coherent off-axis illumination for the second diffraction grating; a phase plate, an attenuator, or both a phase plate and an attenuator, configured to modify the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern, wherein the phase plate, the attenuator, or both the phase plate and the attenuator are arranged between the second diffraction grating and the beam combiner. - View Dependent Claims (12, 13, 14, 15)
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16. A device manufacturing method comprising:
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illuminating a first diffraction grating with a beam of radiation so as to form a first plurality of spatially coherent radiation beams; illuminating a second diffraction grating with at least a portion of the first plurality of spatially coherent radiation beams so as to form a second plurality of spatially coherent radiation beams; modifying the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and subsequently redirecting and combining at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate so as to form an interference pattern. - View Dependent Claims (17, 18, 19, 20, 21)
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Specification