Lithographic apparatus and device manufacturing method

• US 7,952,803 B2
• Filed: 05/15/2006
• Issued: 05/31/2011
• Est. Priority Date: 05/15/2006
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Flagello, Donis George
• Primary Examiner(s): Chang; Audrey Y
• Application Number:
  US11/433,768
• Publication Number:
  US 20070263269A1
• Time in Patent Office: 1,842 Days
• Field of Search: 359/569, 359/566, 359/565, 353/53, 353/67
• US Class Current: 359/569
• CPC Class Codes: G03F 7/70158 Diffractive optical elements
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70308 Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70408 Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect

Abstract

A lithographic apparatus includes a first diffraction grating configured to create a first plurality of spatially coherent radiation beams and a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams. The apparatus also includes a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern.

Claims

1. A lithographic apparatus comprising:

a first beam splitter configured to create a first plurality of spatially coherent radiation beams;

a second beam splitter configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams;

with the first and second beam splitters are diffraction gratings,

a phase plate, an attenuator, or both a phase plate and an attenuator, configured to modify the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and

a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern,

wherein the phase plate, the attenuator, or both the phase plate and the attenuator are arranged between the second beam splitter and the beam combiner.

2. The apparatus of claim 1, wherein each of the diffraction gratings is an alternating phase shift grating or a binary grating.

3. The apparatus of claim 1, wherein each of the diffraction gratings is a one dimensional or a two dimensional grating.

4. The apparatus of claim 1, wherein the portion of the first plurality of spatially coherent beams provides an off-axis illumination for the second beam splitter.

5. The apparatus of claim 1, further comprising a radiation transfer device that is adapted to redirect the portion of the first plurality of radiation beams toward the second beam splitter.

6. The apparatus of claim 5, wherein the radiation transfer device includes a glass rod, a lens or a mirror.

7. The apparatus of claim 1, wherein the beam combiner is a multi-faceted prism.

8. The apparatus of claim 1, wherein the portion of the second plurality of spatially coherent beams includes 2, 3, 4, 6 or 8 beams.

9. The apparatus of claim 1, further comprising a magnification system arranged between the second beam splitter and the beam combiner.

10. The apparatus of claim 1, further comprising a liquid supply system arranged to provide liquid between a surface of the beam combiner and the surface of the substrate.

11. A lithographic apparatus comprising:

a first diffraction grating configured to create a first plurality of spatially coherent radiation beams;

a second diffraction grating configured to receive at least a portion of the first plurality of spatially coherent radiation beams and to create, based on the first plurality of spatially coherent radiation beams, a second plurality of spatially coherent radiation beams;

a radiation transfer device arranged between the first and the second diffraction gratings, the radiation transfer device configured to redirect the portion of the first plurality of spatially coherent radiation beams towards the second diffraction grating such that the first plurality of spatially coherent radiation beams form a coherent off-axis illumination for the second diffraction grating;

a phase plate, an attenuator, or both a phase plate and an attenuator, configured to modify the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and

a beam combiner adapted to redirect and combine at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate to form an interference pattern,

wherein the phase plate, the attenuator, or both the phase plate and the attenuator are arranged between the second diffraction grating and the beam combiner.

12. The apparatus of claim 11, wherein each of the first and second diffraction gratings is an alternating phase shift grating or a binary grating.

13. The apparatus of claim 11, wherein each of the first and second diffraction gratings is a one dimensional or a two dimensional grating.

14. The apparatus of claim 11, wherein the portion of the first plurality of spatially coherent radiation beams form illumination poles that are substantially equidistant from an optical axis of said lithographic apparatus.

15. The apparatus of claim 14, wherein the illumination poles are aligned along two substantially perpendicular directions in a plane that is substantially perpendicular to the optical axis.

16. A device manufacturing method comprising:

illuminating a first diffraction grating with a beam of radiation so as to form a first plurality of spatially coherent radiation beams;

illuminating a second diffraction grating with at least a portion of the first plurality of spatially coherent radiation beams so as to form a second plurality of spatially coherent radiation beams;

modifying the phase, amplitude, or both the phase and amplitude, of one beam of the second plurality of spatially coherent beams relative to another of the secondary plurality of spatially coherent beams; and

subsequently redirecting and combining at least a portion of the second plurality of spatially coherent radiation beams onto a surface of a substrate so as to form an interference pattern.

17. The method of claim 16, wherein illuminating the second diffraction grating includes redirecting the portion of the first plurality of spatially coherent radiation beams formed by the first diffraction grating toward the second diffraction grating.

18. The method of claim 17, wherein the portion of the first plurality of spatially coherent radiation beams is redirected toward the second diffraction grating so as to form an off-axis illumination for the second diffraction grating.

19. The method of claim 16, wherein each of the first and second diffraction gratings is an alternating phase shift grating or a binary grating.

20. The method of claim 16, wherein each of the first and second diffraction gratings is a one dimensional or a two dimensional grating.

21. The method of claim 16, wherein the portion of the second plurality of spatially coherent radiation beams includes 2, 3, 4, 6 or 8 beams.