Capacitively coupled plasma reactor with magnetic plasma control

• US 7,955,986 B2
• Filed: 02/23/2006
• Issued: 06/07/2011
• Est. Priority Date: 05/22/2002
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Miller, Matthew L., Chae, Heeyeop, Yang, Jang Gyoo, Ye, Yan, Hoffman, Daniel J., Barnes, Michael, Ishikawa, Tetsuya
• Primary Examiner(s): LUND, JEFFRIE ROBERT
• Application Number:
  US11/360,944
• Publication Number:
  US 20060157201A1
• Time in Patent Office: 1,930 Days
• Field of Search: 118/723.R, 118/723.E, 118/723.I, 156/345.28, 156/345.46, 156/345.49, 216/67, 427/569, 427/571, 427/589, 438/5, 438/10, 438/714, 438/732, 438/758
• US Class Current: 438/714
• CPC Class Codes: H01J 37/32091 the radio frequency energy being capacitively coupled to the plasma
• CPC Class Codes: H01J 37/3244 Gas supply means
• CPC Class Codes: H01J 37/32623 Mechanical discharge control means
• CPC Class Codes: H01J 37/3266 Magnetic control means

Abstract

A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. A current source is connected to the first solenoidal electromagnet and furnishes a first electric current in the first solenoidal electromagnet whereby to generate within the chamber a magnetic field which is a function of the first electric current, the first electric current having a value such that the magnetic field increases uniformity of plasma ion density radial distribution about the axis of symmetry near a surface of the workpiece support.

Claims

1. In a plasma reactor chamber for processing a semiconductor workpiece, a method of controlling plasma ion distribution within the chamber relative to a desired distribution, comprising:

providing an RF power applicator for said chamber;

providing plural separate concentric coils of different diameters overlying said chamber concentric with a cylindrical axis of symmetry of said chamber and lying in respective exclusive planes parallel with a workpiece support plane of said chamber;

applying RF plasma source power to said RF power applicator to generate a plasma within said chamber, said plasma having an ambient radial distribution in absence of said magnetic field;

changing distribution of said plasma in said chamber from said ambient distribution to a distribution that approximates said desired plasma distribution, by (1) determining a difference between said ambient distribution and said desired distribution, (2) computing a set of D.C. electric currents that, when applied to respective ones of said coils, corrects said difference, and (3) applying respective ones of said set of D.C. currents to respective ones of said coils;

wherein said computing comprises;

(a) determining a mathematical relationship between a magnetic pressure and a radial component of a magnetic field function dependent upon D.C. coil current for each one of said coils; and

(b) in a computer, searching for a set of respective coil currents in respective ones of said coils that produce, in accordance with said relationship, a composite magnetic pressure from all of said coils corresponding to said difference;

wherein said searching comprises computing in said computer a trial composite magnetic pressure for each one of said set of coil currents.

2. The method of claim 1 wherein:

the step of providing plural separate concentric coils comprises providing plural separately powered overhead concentric coils having different diameters.

3. The method of claim 2 arranging said coils in increasing order of diameter with descending distance from said chamber.

4. The method of claim 3 wherein said set of currents comprises D.C. currents of different magnitudes and polarities in respective ones of said coils.

5. The method of claim 1 wherein said desired distribution is a uniform radial distribution.

6. The method of claim 2 wherein different ones of said coils produce respective magnetic fields, whereby a composite of said respective magnetic fields corresponds to said difference.

7. The method of claim 1 wherein said desired distribution is a radial distribution of plasma ion density near said plane of said workpiece.

8. The method of claim 1 wherein said desired distribution is a radial distribution of plasma ion density near a plane of said ceiling electrode.

9. The method of claim 1 wherein said desired distribution is a uniform radial distribution of plasma ion density.

10. The method of claim 1 wherein said desired distribution is a non-uniform radial distribution of plasma ion density.

11. The method of claim 1 wherein said magnetic field function is a square of the magnetic field.

12. In a plasma reactor chamber for processing a workpiece, a method of controlling plasma ion distribution within the chamber relative to a desired distribution, comprising:

providing an RF power applicator for said chamber;

providing plural separately powered overhead concentric coils having different diameters and centered at different heights overlying said chamber and facing a plane of said workpiece, wherein respective ones of said coils produce respective magnetic fields as a function of current flow in said respective coils, resulting in a composite magnetic field in said chamber, said composite magnetic field being a combination of said respective magnetic fields;

applying RF plasma source power to said RF power applicator to generate a plasma within said chamber, said plasma having an ambient radial distribution in absence of said composite magnetic field;

changing distribution of said plasma in said chamber from said ambient distribution to a distribution that approximates said desired distribution, by (1) determining a difference between said ambient distribution and said desired distribution, (2) computing a set of D.C. electric currents that, when applied to respective ones of said coils, corrects said difference, and (3) applying respective ones of said set of D.C. currents to respective ones of said coils;

wherein said computing comprises;

(a) determining a mathematical relationship between a magnetic pressure and a radial component of a magnetic field function dependent upon D.C. coil current for each one of said coils; and

(b) in a computer, searching for a set of respective coil currents in respective ones of said coils that produce, in accordance with said relationship, a composite magnetic pressure from all of said coils corresponding to said difference;

wherein said searching comprises computing in said computer a trial composite magnetic pressure for each one of said set of coil currents.

13. The method of claim 12 wherein said magnetic field function is a square of the magnetic field.