Methods of and apparatuses for measuring electrical parameters of a plasma process
First Claim
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1. A sensor apparatus for measuring a plasma process parameter for processing a workpiece, the sensor apparatus comprising:
- a base;
an information processor supported on or in the base;
a capacitive sensor supported on or in the base and coupled to the information processor, the sensor having a capacitive sensing element configured so as to provide an output that represents a plasma process parameter measurement, wherein the capacitive sensor is configured to measure an electrical property of a plasma without making direct electrical connection to the plasma, wherein the capacitive sensor includes a transducer coupled to the sensing element, the transducer being configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.
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Abstract
A sensor apparatus for measuring a plasma process parameter for processing a workpiece. The sensor apparatus includes a base, an information processor supported on or in the base, and at least one sensor supported on or in the base. The at least one sensor includes at least one sensing element configured for measuring an electrical property of a plasma and at least one transducer coupled to the at least one sensing element. The transducer is configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor.
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Citations
18 Claims
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1. A sensor apparatus for measuring a plasma process parameter for processing a workpiece, the sensor apparatus comprising:
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a base; an information processor supported on or in the base; a capacitive sensor supported on or in the base and coupled to the information processor, the sensor having a capacitive sensing element configured so as to provide an output that represents a plasma process parameter measurement, wherein the capacitive sensor is configured to measure an electrical property of a plasma without making direct electrical connection to the plasma, wherein the capacitive sensor includes a transducer coupled to the sensing element, the transducer being configured so as to receive a signal from the sensing element and converting the signal into a second signal for input to the information processor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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Specification