Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load

• US 7,965,373 B2
• Filed: 06/28/2005
• Issued: 06/21/2011
• Est. Priority Date: 06/28/2005
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoeks, Martinus Hendricus Hendricus, Tinnemans, Patricius Aloysius Jacobus
• Primary Examiner(s): Nguyen; Hung Henry
• Assistant Examiner(s): KREUTZER, COLIN WRIGHT
• Application Number:
  US11/167,918
• Publication Number:
  US 20070009146A1
• Time in Patent Office: 2,184 Days
• Field of Search: 355/53, 355/67, 355/75, 355/77, 355/55, 382/141, 382/232, 382/234, 382/239, 700/21, 700/121, 716/121, 716/55
• US Class Current: 355/53
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70508 Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Abstract

A lithography apparatus with a data-path for converting a representation of a requested dose pattern to a sequence of control data suitable for controlling an array of individually controllable elements. The data path comprises a plurality of data manipulation devices and a calculation load controller for balancing a calculation load between the data manipulation devices. A device manufacturing method using elements of the lithography apparatus, and a flat panel display and integrated circuit device manufactured using the method.

Claims

1. A lithography apparatus, comprising:

a patterning device comprising an array of individually controllable elements configured to impart a pattern to a cross-section of a beam of radiation;

a projection system configured to project the patterned beam of radiation onto a target portion of a substrate;

a data processing pipeline configured to convert a first data representation of a requested dose pattern to a sequence of control data suitable for controlling respective individually controllable elements in the array of individually controllable elements to form the pattern in the beam using the patterning device, such that the requested dose pattern is formed on a substrate, the data processing pipeline comprising,

a plurality of data manipulation devices, and

a calculation load controller configured to divide the first data representation into a plurality of data packets, each corresponding to one of a set of sub-regions of the requested dose pattern corresponding to subsets of the individually controllable elements in the patterning device, and configured to forward each of the data packets to a respective one of the data manipulation devices,

wherein the calculation load controller is configured to select the data packets to forward to each of the data manipulation devices so as to balance a total calculation load between the data manipulation devices, and

wherein the calculation load controller is configured to control a size of each of the sub-regions according to at least one of a degree of pattern irregularity, a pattern entropy, and a compression ratio of the portion of the requested dose pattern corresponding to that sub-region.

2. The lithography apparatus of claim 1, further comprising:

a pattern pre-processor configured to analyze the first data representation and output data indicative of how each of a plurality of areas of the pattern are expected to contribute to the calculation load for at least one stage of the conversion carried out by the data manipulation devices, and

wherein the calculation load controller is configured to select the data packets based on the output data.

3. The lithography apparatus of claim 1, further comprising:

a data re-distribution device configured to receive and re-combine data output from the plurality of data manipulation devices in order to form the sequence of control data.

4. The lithography apparatus of claim 1, wherein the calculation load controller is configured to select data packets for each of the plurality of data manipulation devices substantially at random.

5. The lithography apparatus of claim 4, wherein the sub-regions are selected to be small enough in comparison with features of the requested dose pattern to ensure that the total calculation load is substantially balanced.

6. The lithography apparatus of claim 1, wherein the load controller is configured to control the size of each of the sub-regions according to the degree of pattern irregularity.

7. The lithography apparatus of claim 1, wherein the load controller is configured to control the size of each of the sub-regions according to the pattern entropy.

8. The lithographic apparatus according to claim 1, wherein the load controller is configured to control the size of each of the sub-regions according to the compression ratio.

9. A lithography apparatus, comprising:

a plurality of patterning devices, each comprising an array of individually controllable elements, wherein each patterning device is configured to impart a pattern to a cross-section of one of a plurality of beams of radiation;

a projection system configured to project the plurality of patterned beams of radiation onto respective target portions of a substrate;

a data processing pipeline configured to convert a first data representation of a requested dose pattern to a sequence of control data suitable for controlling respective individually controllable elements in the arrays of individually controllable elements to form the patterns in the beams using the patterning devices, such that the requested dose pattern is formed on a substrate, the data processing pipeline comprising,

a plurality of data manipulation devices, and

a calculation load controller configured to divide the first data representation into a plurality of data packets, each corresponding to one of a set of sub-regions of the requested dose pattern corresponding to subsets of the individually controllable elements in the patterning devices, and configured to forward each of the data packets to a respective one of the data manipulation devices,

wherein the calculation load controller is configured to select the data packets to forward to each of the data manipulation devices so as to balance a total calculation load between the data manipulation devices

wherein the data processing pipeline is configured to convert the first data representation of the requested dose pattern into a plurality of sequences of control data, each suitable for controlling one of the patterning devices in order together substantially to form the requested dose pattern on a substrate; and

wherein each of the data manipulation devices is configured to process data packets in order to generate control data for any one of the patterning devices, and

wherein a geometry of the sub-regions corresponding to any one of the data manipulation devices is uncorrelated with a geometry of variations in entropy in the requested dose pattern.

10. A lithographic apparatus according to claim 9, further comprising:

a pattern pre-processor configured to analyze the first data representation and output data indicative of how each of a plurality of areas of the pattern are expected to contribute to the calculation load for at least one stage of the conversion carried out by the data manipulation devices, and wherein the calculation load controller is configured to select the data packets based on the output data.

11. A lithographic apparatus according to claim 9, further comprising:

a data redistribution device configured to receive and re-arrange data output from the plurality of data manipulation devices in order to form the plurality of sequences of control data.

12. A lithographic apparatus according to claim 9, wherein the calculation load controller is configured to select data packets for each data manipulation device substantially at random.

13. A lithographic apparatus according to claim 12, wherein the sub-regions are arranged to be small enough in comparison with features of the requested dose pattern to ensure that the total calculation load is substantially balanced.

14. A lithographic apparatus according to claim 9, wherein the calculation load controller is configured to forward data packets to at least one of the data manipulation devices that correspond to a set of the sub-regions lying along at least one line oblique to a scanning direction of the substrate relative to the beam of radiation projected thereon.

15. A device manufacturing method, comprising:

using a patterning device comprising an array of individually controllable elements to impart a pattern to a cross-section of a beam of radiation;

using a projection system to project the patterned beam of radiation onto a target portion of a substrate;

converting a first data representation of a requested dose pattern to a sequence of control data suitable for controlling respective individually controllable elements in the array of individually controllable elements to form the pattern in the beam using the patterning device, such that the requested dose pattern is formed on a substrate;

dividing the first data representation into a plurality of data packets, each corresponding to one of a set of sub-regions of the requested dose pattern, and forwarding each of the data packets to one of a plurality of data manipulation devices for the conversion;

selecting the data packets to forward to each of the data manipulation devices in such a way that the total calculation load is balanced between the data manipulation devices; and

controlling the size of each of the sub-regions according to at least one of a degree of pattern irregularity, a pattern entropy, and a compression ratio of the portion of the requested dose pattern corresponding to that sub-region.

16. A device manufacturing method according to claim 15, further comprising:

analyzing the first data representation in order to determine how sub-region contributions to the calculation load for the stage of the conversion carried out by the data manipulation devices are expected to vary as a function of the position of the sub-regions within the requested dose pattern; and

carrying out the selecting step based on the results of the analyzing step.

17. A device manufacturing method according to claim 15, further comprising:

controlling the size of each of the sub-regions according to the degree of pattern irregularity.

18. A device manufacturing method according to claim 15, further comprising:

controlling the size of each of the sub-regions according to the pattern entropy.

19. A device manufacturing method according to claim 15, further comprising:

controlling the size of each of the sub-regions according to the compression ratio.

20. A device manufacturing method according to claim 15, comprising:

using a plurality of patterning devices, each comprising an array of individually controllable elements to impart a pattern to a cross-section of the beam;

converting the first data representation of the requested dose pattern into a plurality of sequences of control data, each suitable for controlling respective individually controllable elements in a given one of the arrays of individually controllable elements to form the pattern in the beam using the patterning devices, such that the requested dose pattern is formed on the substrate; and

using each of the data manipulation devices to process data packets from a plurality of the regions of the requested dose pattern, at least a subset of which are to be formed by different ones of the patterning devices, each comprising arrays of individually controllable elements.