Environmental system including a transport region for an immersion lithography apparatus
First Claim
1. A method of making a device for a liquid immersion lithography apparatus in which a wafer is exposed through a liquid filled in a space between an optical member and the wafer, the method comprising:
- providing a member configured to surround the optical member; and
attaching a passage-forming member having a plurality of passages that generate a capillary force to the member configured to surround the optical member, such that the passage-forming member surrounds the optical member, through which the liquid is collected from a gap between the passage-forming member and a surface of the wafer opposite to the passage-forming member.
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Abstract
A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system that includes a liquid collection member having a permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member, wherein the permeable member has a plurality of passages that generate a capillary force.
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Citations
23 Claims
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1. A method of making a device for a liquid immersion lithography apparatus in which a wafer is exposed through a liquid filled in a space between an optical member and the wafer, the method comprising:
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providing a member configured to surround the optical member; and attaching a passage-forming member having a plurality of passages that generate a capillary force to the member configured to surround the optical member, such that the passage-forming member surrounds the optical member, through which the liquid is collected from a gap between the passage-forming member and a surface of the wafer opposite to the passage-forming member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method used in a liquid immersion lithography apparatus, the method comprising:
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placing a wafer to be exposed under an optical member with a space therebetween which is filled with a liquid; and collecting a liquid from a gap between a passage-forming member of a member configured to surround the optical member and a surface of the wafer opposite to the passage-forming member, wherein the passage-forming member has a plurality of passages that generate capillary force and the passage-forming member is configured to surround the optical member. - View Dependent Claims (14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
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Specification