Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus, comprising:
- an array of individually controllable elements configured to pattern a beam;
a beam divider configured to divide an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern;
a projection system configured to project the first fraction of the patterned beam onto a target portion of a substrate; and
an image sensor configured to inspect at least a portion of the cross-section of the second fraction of the patterned beam,wherein the beam divider is positioned between a last element of the projection system and the substrate.
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Abstract
Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.
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Citations
24 Claims
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1. A lithographic apparatus, comprising:
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an array of individually controllable elements configured to pattern a beam; a beam divider configured to divide an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern; a projection system configured to project the first fraction of the patterned beam onto a target portion of a substrate; and an image sensor configured to inspect at least a portion of the cross-section of the second fraction of the patterned beam, wherein the beam divider is positioned between a last element of the projection system and the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification