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Lithographic apparatus and device manufacturing method

  • US 7,965,380 B2
  • Filed: 02/08/2007
  • Issued: 06/21/2011
  • Est. Priority Date: 10/18/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • an array of individually controllable elements configured to pattern a beam;

    a beam divider configured to divide an intensity of the patterned beam into at least first and second fractions, each having substantially a complete cross-section of the pattern;

    a projection system configured to project the first fraction of the patterned beam onto a target portion of a substrate; and

    an image sensor configured to inspect at least a portion of the cross-section of the second fraction of the patterned beam,wherein the beam divider is positioned between a last element of the projection system and the substrate.

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