Inductively-coupled plasma source

• US 7,969,096 B2
• Filed: 12/15/2006
• Issued: 06/28/2011
• Est. Priority Date: 12/15/2006
• Status: Active Grant

• Current Assignee: MKS Instruments Incorporated
• Original Assignee: MKS Instruments Incorporated
• Inventors: Chen, Xing
• Primary Examiner(s): Owens; Douglas W
• Assistant Examiner(s): Le; Tung X
• Application Number:
  US11/639,680
• Publication Number:
  US 20080142729A1
• Time in Patent Office: 1,656 Days
• Field of Search: 31511121-11181, 250/423.R, 250/424, 219/121.43, 219/121.54, 219/121.57, 219/121.59, 156/345.38, 156/345.48, 204/298.31
• US Class Current: 315/111.21
• CPC Class Codes: C03B 19/143 Plasma vapour deposition
• CPC Class Codes: C03B 37/0183 for plasma within a tube substrate
• CPC Class Codes: C03B 37/01861 Means for changing or stabilising the diameter or form of tubes or rods
• CPC Class Codes: H01J 37/321 the radio frequency energy being inductively coupled to the plasma
• CPC Class Codes: H01J 37/32522 Temperature
• CPC Class Codes: H01J 37/3266 Magnetic control means
• CPC Class Codes: H05H 1/46 using applied electromagnetic fields, e.g. high frequency or microwave energy H05H1/26 takes precedence
• CPC Class Codes: H05H 1/4652 using inductive coupling means, e.g. coils

Abstract

A method and apparatus for exciting gas that involves generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel that includes dielectric material. The magnetic field induces an electric field in the plasma vessel that generates the plasma.

Claims

1. An inductively-coupled plasma source for exciting gases comprising:

a. a plasma vessel comprising a dielectric material; and

b. a transformer comprising a magnetic core defining a gap that generates an alternating magnetic field unidirectionally through the core, across the gap and through the plasma vessel which induces an electric field in the plasma vessel that generates a plasma.

2. The apparatus of claim 1, comprising a primary winding surrounding a portion of the magnetic core or the plasma vessel to carry a current that induces an electromagnetic field.

3. The apparatus of claim 2, comprising a power supply in electrical communication with the primary winding to induce the current in the primary winding.

4. The apparatus of claim 3, wherein the power supply is an AC power supply, an AC switching power supply or an RF power supply.

5. The apparatus of claim 3, comprising an impedance matching network connected between the power supply and the primary winding.

6. The apparatus of claim 2, wherein the primary winding is located distant from the plasma vessel or is electrostatically shielded from the plasma vessel to minimize capacitive coupling between the primary winding and the plasma.

7. The apparatus of claim 2, comprising a circuit for measuring parameters of the primary winding and the plasma generated by the electric field, the parameters including one or more of a current driving the primary winding, a voltage across the primary winding, a bus voltage, an average power in the primary winding, a peak power in the primary winding, a magnitude of the electric field, a temperature of the vessel, a current in the plasma, a plasma light emission, a fluctuation in the plasma, and a gas pressure in the vessel.

8. The apparatus of claim 7, comprising a power control circuit coupled to an output of the circuit for measuring electrical parameters of the primary winding and the plasma, the power control circuit determining the frequency of the power supply and the current driving the primary winding from a measurement of the electrical parameters of the primary winding and of the plasma and from a predetermined set point representing a desired operating condition.

9. The apparatus of claim 1, wherein the dielectric material comprises sapphire, quartz, Y₂O₃, SiC, Si₃N₄, AlN, BN, ZrO₂, alumina, or a ceramic material.

10. The apparatus of claim 1, wherein the magnetic core partially surrounds the plasma vessel.

11. The apparatus of claim 10, wherein the magnetic core is a C core.

12. The apparatus of claim 1 wherein the magnetic core is a plurality of magnetic cores.

13. The apparatus of claim 1, wherein the magnetic core surrounds the plasma vessel.

14. The apparatus of claim 13, wherein the magnetic core is a pair of gapped E cores.

15. The apparatus of claim 1, wherein the plasma vessel comprises a tube.

16. The apparatus of claim 15, wherein the tube comprises a circular cross section, elliptical cross section, a rectangular cross section or a square cross section.

17. The apparatus of claim 15, wherein a property of the electric field varies along a longitudinal axis of the tube to maximize gas excitation in the tube.

18. The apparatus of claim 17, wherein the property is the magnitude of the electric field.

19. The apparatus of claim 1, comprising a gas inlet.

20. The apparatus of claim 19, wherein the gas inlet is configured to maximize stability of the plasma in the plasma vessel.

21. The apparatus of claim 19, wherein the gas inlet is configured to maximize gas excitation in the plasma vessel.

22. The apparatus of claim 19, wherein the gas inlet is configured to direct gas along an inner surface of a wall of the vessel.

23. The apparatus of claim 1, comprising a cooling system including a plurality of cooling elements in thermal communication with the plasma vessel.

24. The apparatus of claim 23, wherein the cooling elements comprise a combination of rigid segments and compliant segments.

25. The apparatus of claim 24, wherein the compliant segments are thermal heat pads or thermal potting compounds.

26. The apparatus of claim 24, wherein the cooling elements are capable of being electrically biased for igniting the plasma in the plasma vessel.

27. The apparatus of claim 23, comprising a spring-loaded structure that applies a force to the cooling elements.

28. The apparatus of claim 23, wherein the cooling elements are electrically segmented.

29. The apparatus of claim 23, wherein the cooling system comprises at least one channel through which a coolant flows.

30. The apparatus of claim 29, wherein the cooling system comprises a coolant flow controller to manage the coolant flow.

31. The apparatus of claim 23, wherein the cooling system comprises a combination of metal and a high thermal conductivity dielectric material.

32. The apparatus of claim 1, comprising an electrode positioned in the plasma vessel capable of generating free charges which assist in ignition of the plasma in the plasma vessel.

33. The apparatus of claim 1, comprising an electrode capacitively coupled to the plasma vessel capable of generating free charges which assist in ignition of the plasma in the plasma vessel.

34. The apparatus of claim 1, comprising an ultraviolet source optically coupled to the plasma vessel capable of generating free charges which assist in ignition of the plasma in the plasma vessel.

35. The apparatus of claim 1, comprising a thermal protection circuit with a network of thermal sensors and thermal switches to protect the plasma vessel and the magnetic core from overheating.

36. The apparatus of claim 1, wherein the plasma vessel comprises an outlet for outputting at least one of ions and excited gases generated by the plasma.

37. The apparatus of claim 36, wherein the outlet outputs at least one of ions and excited gases generated by the plasma to a process chamber.

38. A method for exciting gases with an inductively-coupled plasma source comprising:

a. generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel comprising a dielectric material;

b. inducing an electric field in the plasma vessel; and

c. generating a plasma.

39. The method of claim 38, comprising inducing a current in a primary winding surrounding a portion of the magnetic core or the plasma vessel to generate the magnetic field.

40. The method of claim 39, wherein an AC power supply, an AC switching power supply or a RF power supply is used to induce the current in the primary winding.

41. The method of claim 40, wherein an impedance matching network is used to adjust a frequency of the power supply.

42. The method of claim 39, comprising minimizing capacitive coupling between the primary winding and the plasma vessel.

43. The method of claim 39, comprising measuring a parameter of the primary winding and of the plasma.

44. The method of claim 38, comprising varying a property of the electric field along a longitudinal axis of the plasma vessel.

45. The method of claim 44, wherein varying the property of the electric field comprises varying a magnitude of the electric field to maximize gas excitation in the plasma vessel.

46. The method of claim 38, comprising supplying a gas to the plasma vessel via a gas inlet.

47. The method of claim 46, comprising configuring the gas inlet to maximize stability of the plasma in the plasma vessel.

48. The method of claim 46, wherein supplying the gas to the plasma vessel comprises maximizing gas excitation in the plasma vessel.

49. The method of claim 46, wherein supplying the gas to the plasma vessel comprises directing the gas along an inner surface of a wall in the plasma vessel.

50. The method of claim 38, comprising controlling a temperature of the plasma vessel.

51. The method of claim 50, comprising positioning a cooling element in thermal communication with the plasma vessel to control the temperature of the plasma vessel.

52. The method of claim 38, comprising generating free charges in the plasma vessel.

53. The method of claim 52, wherein generating free charges comprises applying a voltage to a primary winding surrounding a magnetic core at least partially surrounding the plasma vessel.

54. The method of claim 52, wherein generating free charges comprises applying a voltage to an electrode in the plasma vessel.

55. The method of claim 52, wherein generating free charges comprises capacitively coupling an electrode to the plasma vessel.

56. The method of claim 52, wherein generating free charges comprises optically coupling an ultraviolet source to the plasma vessel.

57. The method of claim 38, comprising providing a thermal protection circuit with a network of thermal sensors and thermal switches to protect the plasma vessel and the magnetic core from overheating.

58. The method of claim 38, comprising outputting ions generated by the plasma.

59. An inductively-coupled plasma source for exciting gases comprising:

a. means for generating an alternating magnetic field unidirectionally through a magnetic core defining a gap, across the gap and through a plasma vessel comprising a dielectric material; and

b. means for inducing an electric field in the plasma vessel to generate a plasma.