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Environmental system including a transport region for an immersion lithography apparatus

  • US 7,969,552 B2
  • Filed: 06/28/2007
  • Issued: 06/28/2011
  • Est. Priority Date: 04/10/2003
  • Status: Expired due to Fees
First Claim
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1. A method of making a device for a liquid immersion lithography apparatus in which a wafer is exposed through a liquid filled in a space between an optical member and the wafer, the method comprising:

  • providing a member configured to surround the optical member; and

    attaching a wick structure member to the member configured to surround the optical member, such that the wick structure member surrounds the optical member, through which the liquid is collected from a gap between the wick structure member and a surface of the wafer opposite to the wick structure member.

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