Method for performing pattern decomposition based on feature pitch
First Claim
1. A method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, comprising the steps of:
- (a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius;
(b) defining said features utilizing a plurality of pixels;
(c) disposing said kernel over a first pixel of said plurality of pixels;
(d) determining the value of the kernel at location of each of said plurality of pixels, storing said value for each of said plurality of pixels so as to define a pixel value for each of said plurality of pixels;
(e) adding a previously stored value associated with a given pixel of said plurality of pixels with said pixel value of the given pixel determined in step (d);
(f) disposing said kernel over another pixel of said plurality of pixels, and repeating steps (d)-(f) until each of said plurality of pixels has been processed; and
(g) determining placement of each of said plurality of pixels in a first pattern or a second pattern based on the pixel value of the given pixel.
3 Assignments
0 Petitions
Accused Products
Abstract
A method for decomposing a target pattern containing features to be printed on a wafer. The method includes the steps of: (a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining the features utilizing a plurality of pixels; (c) disposing the kernel over a first pixel of the plurality of pixels; (d) determining the value of the kernel at location of each of the plurality of pixels, storing the value for each of the plurality of pixels so as to define a pixel value for each of the plurality of pixels; (e) adding a previously stored value associated with a given pixel of the plurality of pixels with the pixel value of the given pixel determined in step (d); (f) disposing the kernel over another pixel of the plurality of pixels, and repeating steps (d)-(f) until each of the plurality of pixels has been processed; and (g) determining placement of the pixel in a first pattern or a second pattern based on the pixel value of the given pixel.
-
Citations
23 Claims
-
1. A method for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, comprising the steps of:
-
(a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining said features utilizing a plurality of pixels; (c) disposing said kernel over a first pixel of said plurality of pixels; (d) determining the value of the kernel at location of each of said plurality of pixels, storing said value for each of said plurality of pixels so as to define a pixel value for each of said plurality of pixels; (e) adding a previously stored value associated with a given pixel of said plurality of pixels with said pixel value of the given pixel determined in step (d); (f) disposing said kernel over another pixel of said plurality of pixels, and repeating steps (d)-(f) until each of said plurality of pixels has been processed; and (g) determining placement of each of said plurality of pixels in a first pattern or a second pattern based on the pixel value of the given pixel. - View Dependent Claims (2, 3, 4, 5, 6)
-
-
7. A non-transitory computer readable storage medium storing a computer program for decomposing a target pattern containing features to be printed on a wafer, into multiple patterns, when executed, causing a computer to perform the steps of:
-
(a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining said features utilizing a plurality of pixels; (c) disposing said kernel over a first pixel of said plurality of pixels; (d) determining the value of the kernel at location of each of said plurality of pixels, storing said value for each of said plurality of pixels so as to define a pixel value for each of said plurality of pixels; (e) adding a previously stored value associated with a given pixel of said plurality of pixels with said pixel value of the given pixel determined in step (d); (f) disposing said kernel over another pixel of said plurality of pixels, and repeating steps (d)-(f) until each of said plurality of pixels has been processed; and (g) determining placement of each of said plurality of pixels in a first pattern or a second pattern based on the pixel value of the given pixel. - View Dependent Claims (8, 9, 10, 11, 12)
-
-
13. A device manufacturing method comprising the steps of:
-
(a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining features utilizing a plurality of pixels; (c) disposing said kernel over a first pixel of said plurality of pixels; (d) determining the value of the kernel at location of each of said plurality of pixels, storing said value for each of said plurality of pixels so as to define a pixel value for each of said plurality of pixels; (e) adding a previously stored value associated with a given pixel of said plurality of pixels with said pixel value of the given pixel determined in step (d); (f) disposing said kernel over another pixel of said plurality of pixels, and repeating steps (d)-(f) until each of said plurality of pixels has been processed; (g) determining placement of each of said plurality of pixels in a first pattern or a second pattern based on the pixel value of the given pixel; and (h) manufacturing a device using masks corresponding to said first pattern and said second pattern. - View Dependent Claims (14, 15, 16, 17, 18)
-
-
19. A method for generating masks to be utilized in a photolithography process, said method comprising the steps of:
-
(a) defining a kernel representing a function having positive values within an inner radius and negative values in an outer radius; (b) defining features utilizing a plurality of pixels; (c) disposing said kernel over a first pixel of said plurality of pixels; (d) determining the value of the kernel at location of each of said plurality of pixels, storing said value for each of said plurality of pixels so as to define a pixel value for each of said plurality of pixels; (e) adding a previously stored value associated with a given pixel of said plurality of pixels with said pixel value of the given pixel determined in step (d); (f) disposing said kernel over another pixel of said plurality of pixels, and repeating steps (d)-(f) until each of said plurality of pixels has been processed; (g) determining placement of each of said plurality of pixels in a first pattern or a second pattern based on the pixel value of the given pixel; and (h) generating a first mask corresponding to said first pattern, and a second mask corresponding to said second pattern. - View Dependent Claims (20, 21, 22, 23)
-
Specification