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Method for providing metal extension in backside illuminated sensor for wafer level testing

  • US 7,973,380 B2
  • Filed: 09/18/2006
  • Issued: 07/05/2011
  • Est. Priority Date: 11/23/2005
  • Status: Active Grant
First Claim
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1. An apparatus comprising a back side illuminated image sensor that includes:

  • a substrate having a front side and a back side that is opposite to the front side;

    an image-sensing pixel formed within the substrate, the pixel being operable to sense radiation that enters the substrate from the back side;

    a first bond pad positioned above the front side of the substrate;

    a second bond pad positioned to be accessible from the back side of the substrate; and

    an electrical connection for connecting the first and second bond pads to form a metal extension bond pad.

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