Multiple wavelength X-ray source
First Claim
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1. An x-ray source device, comprising:
- a) an evacuated tube;
b) an anode coupled to the tube and including a window and a target;
c) the target having a material configured to produce x-rays in response to impact of electrons;
d) a cathode coupled to the tube opposing the anode and including at least one electron source configured to produce electrons accelerated towards the target in response to an electric field between the anode and the cathode, defining an electron beam;
e) the target having an outer thicker region and an inner thinner region; and
f) a means for expanding and narrowing the electron beam while maintaining a center of the electron beam in substantially the same location, wherein the means for expanding and narrowing the electron beam;
i) narrows the electron beam to impinge mostly upon the thinner inner region of the target when a lower voltage is applied across the cathode and the anode; and
ii) expands the electron beam to impinge upon the thicker outer region of the target when a higher voltage is applied across the cathode and the anode.
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Abstract
A multiple wavelength x-ray source includes a multi-thickness target, having at least a first and a second thickness. The first thickness can substantially circumscribe the second thickness. An electron beam can be narrowed to impinge primarily upon second thickness or expanded to impinge primarily upon the first thickness while maintaining a constant direction of the beam. This invention allows the target thickness to be optimized for the desired output wavelength without the need to redirect or realign the x-rays towards the target.
241 Citations
21 Claims
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1. An x-ray source device, comprising:
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a) an evacuated tube; b) an anode coupled to the tube and including a window and a target; c) the target having a material configured to produce x-rays in response to impact of electrons; d) a cathode coupled to the tube opposing the anode and including at least one electron source configured to produce electrons accelerated towards the target in response to an electric field between the anode and the cathode, defining an electron beam; e) the target having an outer thicker region and an inner thinner region; and f) a means for expanding and narrowing the electron beam while maintaining a center of the electron beam in substantially the same location, wherein the means for expanding and narrowing the electron beam; i) narrows the electron beam to impinge mostly upon the thinner inner region of the target when a lower voltage is applied across the cathode and the anode; and ii) expands the electron beam to impinge upon the thicker outer region of the target when a higher voltage is applied across the cathode and the anode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method of producing multiple wavelengths of x-rays from a single target, the method comprising:
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a) narrowing an electron beam to impinge primarily upon a central portion of the target for producing mostly x-rays of a first wavelength; and b) expanding the electron beam to impinge primarily upon an outer portion of the target for producing mostly x-rays of a second wavelength.
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11. The method of 10, wherein the target has an outer region circumscribing an inner region;
- and wherein the outer region has a different thickness than the inner region.
- View Dependent Claims (12, 13)
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14. An x-ray source device, comprising:
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a) an evacuated tube; b) an anode coupled to the tube and including a window and a target; c) the target having a material configured to produce x-rays in response to impact of electrons; d) a cathode coupled to the tube opposing the anode and including at least one electron source configured to produce electrons accelerated towards the target in response to an electric field between the anode and the cathode, defining an electron beam; e) the target having an thinner outer region and an thicker inner region; and f) a means for expanding and narrowing the electron beam while maintaining a center of the electron beam in substantially the same location, wherein the means for expanding and narrowing the electron beam; i) narrows the electron beam to impinge mostly upon the thicker inner region of the target when a higher voltage is applied across the cathode and the anode; and ii) expands the electron beam to impinge upon the thinner outer region of the target when a lower voltage is applied across the cathode and the anode. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21)
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Specification