Reactor design to reduce particle deposition during process abatement

• US 7,985,379 B2
• Filed: 08/14/2007
• Issued: 07/26/2011
• Est. Priority Date: 11/12/2004
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Crawford, Shaun W., Todd, Leonard B., Jung, Jay J., Chiu, Ho-Man Rodney, Vermeulen, Robbert, Clark, Daniel O.
• Primary Examiner(s): Duong; Tom
• Application Number:
  US11/838,435
• Publication Number:
  US 20070274876A1
• Time in Patent Office: 1,442 Days
• Field of Search: 422/168, 422/169, 422/171, 422/172, 422/173, 552/40, 552/48
• US Class Current: 422/168
• CPC Class Codes: F23D 2900/00016 Preventing or reducing deposit build-up on burner parts, e.g. from carbon
• CPC Class Codes: F23G 7/065 using gaseous or liquid fuel
• CPC Class Codes: F23J 9/00 Preventing premature solidification of molten combustion residues
• CPC Class Codes: F23M 2900/05002 Means for accommodate thermal expansion of the wall liner
• CPC Class Codes: F23M 2900/05004 Special materials for walls or lining
• CPC Class Codes: F23M 5/085 using air or other gas as the cooling medium

Abstract

The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated ceramic rings through which fluid, e.g., gases, may be directed to form a boundary layer along the interior wall of the thermal reaction chamber, thereby reducing particulate matter buildup thereon. The systems further include the introduction of fluids from the center pilot jet to alter the aerodynamics of the interior of the thermal reaction chamber.

Claims

1. An apparatus for use during the abatement of a semiconductor manufacturing process comprising:

a thermal reaction unit having;

an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections;

at least one waste gas inlet in fluid communication with the central chamber and adapted to introduce a gaseous waste stream to the central chamber;

a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products;

a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber;

a water quench unit coupled to the thermal reaction unit and adapted to receive a gas stream from the thermal reaction unit; and

a shield configured to be positioned between the quench unit and the interior porous wall and adapted to prevent water wetting a bottommost porous section of the plurality of stacked porous sections, the shield including an air knife inlet, wherein the air knife inlet injects an air knife to remove deposited material from the interior porous wall.

2. The apparatus of claim 1, wherein the interior porous wall has a generally tubular form.

3. The apparatus of claim 1, wherein each of the stacked porous sections are arcuate in shape.

4. The apparatus of claim 1, wherein the interior porous wall comprises at least about twenty stacked porous sections.

5. The apparatus of claim 1, wherein the stacked porous sections are complimentarily jointed for connection of adjacent porous sections.

6. The apparatus of claim 5, wherein each stacked porous section is complimentarily jointed with at least one joint selected from the group consisting of ship-lap joints, beveled joints, butt joints, lap joints and tongue-and-groove joints.

7. The apparatus of claim 1, wherein each stacked porous section comprises a porous ceramic.

8. The apparatus of claim 1, wherein each stacked porous section comprises a reticulated ceramic.

9. The apparatus of claim 8 wherein each stacked porous section comprises material selected from the group consisting of alumina materials, magnesium oxide, refractory metal oxides, silicon carbide, silicon nitride, and yttria-doped alumina materials.

10. The apparatus of claim 1, wherein the thermal reaction chamber is adapted so that more fluid flows through the interior porous wall in proximity to the waste gas inlet than in proximity to an outlet of the thermal reaction unit.

11. The apparatus of claim 1 further comprising a first exterior wall that surrounds the interior porous wall, the first exterior wall having a plurality of perforations for passage of fluid through the first exterior wall to the interior porous wall.

12. The apparatus of claim 11, wherein the first exterior wall comprises corrosion-resistant and thermally stable metal.

13. The apparatus of claim 12, wherein the first exterior wall comprises a material selected from the group consisting of stainless steel, austenitic nickel-chromium-iron alloys and other nickel-based alloys.

14. The apparatus of claim 11 further comprising:

a second exterior wall that surrounds the first exterior wall and the interior porous wall and that defines an interior space between the second exterior wall and the first exterior wall;

wherein the fluid delivery system is adapted to provide a fluid to the central chamber through the interior porous wall by providing fluid to the interior space between the second exterior wall and the first exterior wall.

15. The apparatus of claim 1 further comprising:

a second reaction chamber coupled to the thermal reaction unit and having;

a gas flow chamber in fluid communication with the central chamber, the gas flow chamber having an inlet and outlet for passing the gaseous waste stream and reaction products through the gas flow chamber; and

the water quench unit, wherein the water quench unit is adapted to generate a flowing liquid film on an interior surface of the gas flow chamber so as to reduce deposition and accumulation of particulate solids on the interior surface of the gas flow chamber.

16. The apparatus of claim 1 wherein the thermal mechanism further includes a bore-hole through a center jet adapted to introduce a stream of high velocity fluid into the thermal reaction unit.

17. The apparatus of claim 16 wherein the high velocity fluid pulls reaction products towards a center of the thermal reaction unit.

18. An apparatus for use during the abatement of a semiconductor manufacturing process comprising:

a upper reaction chamber having;

an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked, replaceable porous sections;

a first exterior wall that surrounds and supports the stacked porous sections of the interior porous wall and that includes a plurality of perforations that allow passage of fluid through the first exterior wall to the interior porous wall;

a second exterior wall that surrounds the first exterior wall and the interior porous wall and that defines an interior space between the second exterior wall and the first exterior wall;

at least one waste gas inlet in fluid communication with the central chamber and adapted to introduce a gaseous waste stream to the central chamber;

at least one fuel inlet in fluid communication with the central chamber and adapted to introduce fuel to the central chamber;

a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and

a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; and

a lower reaction chamber coupled to the upper reaction chamber and having;

a gas flow chamber in fluid communication with the central chamber, the gas flow chamber having an inlet and outlet for passing the gaseous waste stream and reaction products through the gas flow chamber;

a water delivery system adapted to generate a flowing liquid film on an interior surface of the gas flow chamber so as to reduce deposition and accumulation of particulate solids on the interior surface of the gas flow chamber; and

a shield configured to be positioned between the quench unit and the interior porous wall and adapted to prevent water wetting a bottommost porous section of the plurality of stacked porous sections, the shield including an air knife inlet, wherein the air knife inlet injects an air knife to remove deposited material from the interior porous wall.

19. The system of claim 18 further comprising an interior porous plate that encloses an inlet end of the central chamber, the interior porous plate adapted to pass a fluid through the interior porous plate to the central chamber so as to reduce deposition of particulate matter on an interior surface of the interior porous plate.

20. The system of claim 18 further comprising at least one inlet adapted to introduce fluid to a gas stream as the gas stream travels from the upper reaction chamber to the lower reaction chamber.

21. The system of claim 18 further comprising a drainage tank coupled to the lower reaction chamber having headspace adapted to receive a gaseous waste stream from the lower reaction chamber.

22. The system of claim 21 further comprising at least one scrubbing unit adapted to receive the gaseous waste stream from the headspace of the drainage tank.

23. A replacement part for use in an abatement system comprising:

a shield including an air knife inlet, the shield configured to;

be positioned between a quench unit and a porous wall that defines a central chamber of a thermal reactor for use during decomposition of gaseous waste from a semiconductor manufacturing process; and

prevent the porous wall of the central chamber from getting wet during operation of the quench unit, and

wherein the air knife inlet injects an air knife into the central chamber to remove deposited material from the interior porous wall.

24. The replacement part of claim 23 wherein shield is L-shaped.

25. The replacement part of claim 23 wherein the shield is configured to assume a three-dimensional form of a bottom portion of the porous wall.

26. The replacement part of claim 25 wherein the porous wall includes a bottom-most ceramic ring and wherein the shield is a ring that prevents water from coming into contact with the bottom-most ceramic ring.

27. The replacement part of claim 23 wherein the shield comprises a material selected from the group consisting of stainless steel, austenitic nickel-chromium-iron alloys and other nickel-based alloys.