Immersion lithography apparatus and methods
First Claim
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1. An immersion lithography apparatus, comprising:
- an imaging lens module;
a substrate table positioned underlying the imaging lens module and configured to hold a substrate;
an immersion fluid retaining module; and
a cleaning module adapted to clean the imaging lens module, substrate table, and immersion fluid retaining module, wherein the cleaning module includes an ultrasonic unit, wherein the cleaning module is a distinct module separate from the substrate table and the immersion fluid retaining module, and wherein the cleaning module is integrated with a robot.
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Abstract
A lithography apparatus includes an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; and a cleaning module adapted to clean the lithography apparatus. The cleaning module is selected from the group consisting of an ultrasonic unit, a scrubber, a fluid jet, an electrostatic cleaner, and combinations thereof.
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Citations
20 Claims
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1. An immersion lithography apparatus, comprising:
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an imaging lens module; a substrate table positioned underlying the imaging lens module and configured to hold a substrate; an immersion fluid retaining module; and a cleaning module adapted to clean the imaging lens module, substrate table, and immersion fluid retaining module, wherein the cleaning module includes an ultrasonic unit, wherein the cleaning module is a distinct module separate from the substrate table and the immersion fluid retaining module, and wherein the cleaning module is integrated with a robot. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An immersion lithography apparatus, comprising:
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an imaging lens module; a substrate table configured to secure a substrate and positioned under the imaging lens; a fluid module configured to provide a fluid to a space between the imaging lens module and a substrate on the stage; and an ultrasonic unit configured to clean the immersion lithography apparatus, wherein the ultrasonic unit is configured to move to various locations in the apparatus independently of the substrate table. - View Dependent Claims (13, 14, 15)
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16. A method, comprising:
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providing a lithography apparatus having a cleaning module, wherein the cleaning module includes an ultrasonic unit, and wherein the lithography apparatus includes imaging a lens module, a substrate table, and an immersion fluid retaining module, and wherein the cleaning module is operable to move independently of each of the lens module, the substrate table, and the immersion fluid retaining module; moving the cleaning module to a first position; performing a cleaning process to the imaging lens module, substrate table, and immersion fluid retaining module by utilizing the cleaning module, while the cleaning module is at the first position; moving the cleaning module to a second position; and performing an exposure process to a substrate coated with an imaging layer, while the cleaning module is at the second position. - View Dependent Claims (17, 18, 19, 20)
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Specification