Projection objective of a microlithographic projection exposure apparatus
First Claim
Patent Images
1. An apparatus, comprising:
- a first optical element that is refractive;
a second element;
a liquid between the first optical element and the second element; and
an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element substantially without causing a deformation of the second element,wherein the apparatus is a microlithographic projection exposure apparatus.
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Abstract
A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.
36 Citations
47 Claims
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1. An apparatus, comprising:
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a first optical element that is refractive; a second element; a liquid between the first optical element and the second element; and an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element substantially without causing a deformation of the second element, wherein the apparatus is a microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43)
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44. An apparatus, comprising:
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a first optical element that is refractive, the first optical element having a thickness distribution in its undeformed state which is rotationally asymmetric, a second element, a fluid between the first optical element and the second element; and means for deforming the first optical element, wherein the apparatus is a microlithographic projection exposure apparatus. - View Dependent Claims (45)
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46. An apparatus, comprising:
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a first optical element that is refractive; a second element; a liquid between the first optical element and the second element; and an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element substantially without causing a deformation of the second element, wherein a ratio between the refractive index of the first optical element and the refractive index of the liquid is between 0.9 and 1.1, and the apparatus is a microlithographic projection exposure apparatus. - View Dependent Claims (47)
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Specification