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Projection objective of a microlithographic projection exposure apparatus

  • US 7,990,622 B2
  • Filed: 10/01/2010
  • Issued: 08/02/2011
  • Est. Priority Date: 07/25/2005
  • Status: Active Grant
First Claim
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1. An apparatus, comprising:

  • a first optical element that is refractive;

    a second element;

    a liquid between the first optical element and the second element; and

    an actuator coupled to the first optical element such that operation of the actuator causes a rotationally asymmetric deformation of the first optical element substantially without causing a deformation of the second element,wherein the apparatus is a microlithographic projection exposure apparatus.

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