Systems and methods for wafer translation

• US 7,993,093 B2
• Filed: 09/15/2004
• Issued: 08/09/2011
• Est. Priority Date: 09/15/2004
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Mimken, Victor
• Primary Examiner(s): Rudawitz; Joshua I
• Application Number:
  US10/941,600
• Publication Number:
  US 20060104795A1
• Time in Patent Office: 2,519 Days
• Field of Search: 414/763, 414/805.6, 414/816, 414/936, 414/938, 414/941, 901/31, 901/28, 901/2, 744/900.4, 294/106, 294/99.1, 294/86.4
• US Class Current: 414/763
• CPC Class Codes: H01L 21/67057 with the semiconductor substrates being dipped in baths or vessels
• CPC Class Codes: H01L 21/67742 Mechanical parts of transfer devices robots in general in B25J
• CPC Class Codes: H01L 21/68707 the wafers being placed on a robot blade, or gripped by a gripper for conveyance
• CPC Class Codes: Y10S 414/136 including wafer orienting means

Abstract

A two-axis automation system can be used to transfer and rotate wafers between horizontal and vertical orientations necessary for differing steps in a semiconductor fabrication process. The two rotational axes allow for the transfer and rotation to be done in a minimal space and with a minimum amount of swept volume. A transfer arm of the automation system can include a pair of load pads capable of loading and unloading a wafer processing chamber in a single sweep.

Claims

1. A wafer translation apparatus, comprising:

a transfer arm including an incoming load pad for receiving an edge of an incoming wafer to be processed;

an incoming gripping mechanism positioned on the transfer arm and capable of gripping the edge of the incoming wafer received in the incoming load pad, the incoming load pad and incoming gripping mechanism capable of releasably supporting the incoming wafer therebetween;

a first rotational assembly capable of rotating the transfer arm about a first rotational axis such that the incoming wafer supported by the incoming load pad and incoming gripping mechanism can be rotated between a substantially horizontal orientation and a substantially vertical orientation;

a second rotational assembly capable of rotating the transfer arm about a second rotational axis, the second rotational axis being orthogonal to the first rotational axis, wherein rotation of the transfer arm about the first and second rotational axes causes the incoming wafer to be translated from a first location and first orientation to a second location and second orientation; and

a process elevator that is adapted to receive the incoming wafer positioned in the second location and the second orientation, wherein the process elevator is adapted to transfer the incoming wafer to a processing chamber.

2. An apparatus according to claim 1, wherein:

the second location is oriented to align the wafer with a receiving slot of a wafer processing chamber.

3. An apparatus according to claim 1, wherein:

the first location is a wafer support station.

4. An apparatus according to claim 1, wherein:

The first orientation is a horizontal orientation and the second orientation is a vertical orientation.

5. An apparatus according to claim 1, further comprising:

an outgoing load pad and outgoing gripping mechanism on the transfer arm, the outgoing load pad and outgoing gripping mechanism capable of releasably supporting an outgoing wafer therebetween.

6. An apparatus according to claim 1, wherein:

the transfer arm is capable of being rotated by the first and second rotational assemblies such that the incoming wafer can be moved into position to be received by a wafer processing station, and an outgoing wafer having been processed can be extracted from the wafer processing station.

7. An apparatus according to claim 6, wherein:

the transfer arm is further capable of being rotated by the first and second rotational assemblies to deliver the outgoing wafer to the first position and first orientation.

8. An apparatus according to claim 1, further comprising

a slide table capable of receiving the incoming wafer from an automation system and sliding the incoming wafer into the first position by use of an actuator, wherein the incoming wafer can be received in the incoming load pad.

9. An apparatus according to claim 8, wherein:

the slide table includes a latching mechanism capable of releasably contacting the edge of the incoming wafer, wherein the incoming wafer can be supported between the latching mechanism and at least two support members.

10. An apparatus according to claim 1, wherein:

the incoming gripping mechanism is rotatably connected to the transfer arm using flexural hinges, each flexural hinge including an elastic wire.

11. An apparatus according to claim 10, wherein:

the elastic wire is a NITINOL wire.

12. An apparatus according to claim 1, wherein:

at least one of the incoming load pad and the incoming gripping mechanism includes a sensor for determining the presence of the incoming wafer.

13. An apparatus according to claim 1, wherein:

each of the incoming load pad and incoming gripping mechanism includes a groove therein for accepting the edge of the incoming wafer.

14. An apparatus according to claim 13, wherein:

at least the groove in each of the incoming load pad and incoming gripping mechanism is made of polytherimide accepting material.

15. The wafer translation apparatus of claim 1, wherein the processing chamber is oriented to process a wafer vertically.

16. A wafer translation apparatus, comprising:

a transfer arm including an incoming load pad for receiving an edge of an incoming wafer to be processed;

an incoming gripping mechanism positioned on the transfer arm and capable of gripping the edge of the incoming wafer received in the incoming load pad, the incoming load pad and incoming gripping mechanism capable of releasably supporting the incoming wafer therebetween;

a first rotational assembly capable of rotating the transfer arm about a first rotational axis such that the incoming wafer supported by the incoming load pad and incoming gripping mechanism can be rotated between a substantially horizontal orientation and a substantially vertical orientation;

a second rotational assembly capable of rotating the transfer arm about a second rotational axis, the second rotational axis being orthogonal to the first rotational axis, wherein rotation of the transfer arm about the first and second rotational axes causes the incoming wafer to be translated from a first location and first orientation to a second location and second orientation;

an outgoing load pad and outgoing gripping mechanism on the transfer arm, the outgoing load pad and outgoing gripping mechanism capable of releasably supporting an outgoing wafer therebetween; and

the outgoing and incoming load pads are skewed with respect to another at an angle of approximately 15°

.

17. A translation apparatus for transferring a wafer to a processing station, comprising:

a process elevator having a wafer receiving end effector, wherein the process elevator is adapted to transfer an incoming wafer to a processing station which is adapted to process a substrate in a vertical orientation;

a transfer arm for receiving a plurality of wafers, wherein the transfer arm comprises;

an incoming load pad that is adapted to support the incoming wafer; and

an outgoing load pad that is adapted to support an outgoing wafer;

a first rotational assembly capable of rotating the transfer arm about a first rotational axis such that the incoming wafer can be rotated between a substantially horizontal orientation and a substantially vertical orientation; and

a second rotational assembly capable of rotating the transfer arm about a second rotational axis, wherein rotation of the transfer arm about the first and second rotational axes causes the incoming wafer to be translated from a first location and first orientation to a second location and second orientation, and the wafer is in position to be received by the end effector.

18. An apparatus according to claim 17, wherein:

the first orientation is a horizontal orientation and the second orientation is a vertical orientation.

19. An apparatus according to claim 17, wherein:

the transfer arm is capable of being rotated by the first and second rotational assemblies such that the incoming wafer can be moved into position to be received by the end effector, and an outgoing wafer having been processed can be extracted from the end effector.

20. A method for translating and rotating a wafer for processing, comprising:

receiving the edge of an incoming wafer into an incoming load pad of a transfer arm;

gripping the edge of the incoming wafer received in the incoming load pad with an incoming gripping mechanism, the incoming load pad and incoming gripping mechanism capable of releasably supporting the incoming wafer therebetween;

rotating the transfer arm about a first rotational axis such that the incoming wafer supported by the incoming load pad and incoming gripping mechanism can be rotated between a substantially horizontal and a substantially vertical orientation;

rotating the transfer arm about a second rotational axis, the second rotational axis being orthogonal to the first rotational axis, wherein rotation of the transfer arm about the first and second rotational axes causes the incoming wafer to be translated from an initial location and initial orientation to a transfer location and processing orientation;

transferring the wafer from the incoming load pad to an end effector; and

positioning the wafer disposed on the end effector in a desired position within a process chamber by use of a transferring mechanism.

21. A method according to claim 20, further comprising:

gripping the edge of an outgoing wafer between an outgoing gripping mechanism and an outgoing load pad of the transfer arm before rotating the incoming wafer into the processing location.

22. A method according to claim 20, further comprising:

releasing a latch mechanism of the slide table when the incoming wafer is releasably supported by the incoming load pad and incoming gripping mechanism.

25. The method according to claim 20, wherein the processing orientation is a vertical orientation.

26. The wafer translation apparatus of claim 20, further comprising orienting the processing chamber to process a wafer vertically.

23. A method for translating and rotating a wafer for processing, comprising:

receiving a wafer on an incoming load pad coupled to a transfer arm assembly;

rotating the transfer arm about a first rotational axis such that the wafer can be rotated between a substantially horizontal and substantially vertical orientation;

rotating the transfer arm about a second rotational axis, the second rotational axis being orthogonal to the first rotational axis, wherein rotation of the transfer arm about the first and second rotational axes causes the wafer to be translated from an initial location and horizontal orientation to a transfer location and vertical orientation;

transferring the wafer from the incoming load pad to an end effector;

positioning the wafer disposed on the end effector in a desired position within a vertically oriented process chamber by use of a transferring mechanism; and

transferring the wafer from the end effector to an outgoing load pad coupled to the transfer arm assembly.

24. The method according to claim 23, further comprising:

transferring the wafer from the outgoing load pad to one or more supports;

engaging the wafer with a latch mechanism when the wafer is disposed on the one or more supports.