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Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

  • US 7,995,186 B2
  • Filed: 01/11/2007
  • Issued: 08/09/2011
  • Est. Priority Date: 10/08/2003
  • Status: Expired due to Fees
First Claim
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1. A lithographic projection apparatus comprising:

  • a substrate table by which a substrate is held;

    a projection system via which a patterned beam of radiation is projected onto the substrate to produce an exposed substrate;

    a liquid supply system by which liquid is supplied to a space between the projection system and the substrate; and

    a residual liquid detector that detects liquid remaining on the exposed substrate after an exposure is completed and before the exposed substrate is developed and before the exposed substrate is held on a holding table other than the substrate table, whereinthe residual liquid detector performs liquid detection on a way to the holding table while the substrate is moving relative to the residual liquid detector.

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