Methods and systems for generating information to be used for selecting values for one or more parameters of a detection algorithm
First Claim
1. A method for generating information to be used for selecting values for one or more parameters of a detection algorithm, comprising:
- performing a scan of an area of a wafer using an inspection system and default values for one or more parameters of a detection algorithm to detect defects on the wafer, wherein the area of the wafer comprises an entire area of the wafer that will be scanned using an inspection recipe, and wherein the scan is performed without user intervention;
selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the one or more parameters of the detection algorithm; and
storing information for the portion of the defects, wherein the information comprises values for the one or more parameters of the detection algorithm determined for the defects in the portion, and wherein the information can be used to select the values for the one or more parameters of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
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Accused Products
Abstract
Methods and systems for generating information to be used for selecting values for parameter(s) of a detection algorithm are provided. One method includes without user intervention performing a scan of an area of a wafer using an inspection system and default values for parameter(s) of a detection algorithm to detect defects on the wafer. The method also includes selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the parameter(s) of the detection algorithm. The method further includes storing information, which includes values for the parameter(s) of the detection algorithm determined for the defects in the portion. The information can be used to select the values for the parameter(s) of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
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Citations
20 Claims
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1. A method for generating information to be used for selecting values for one or more parameters of a detection algorithm, comprising:
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performing a scan of an area of a wafer using an inspection system and default values for one or more parameters of a detection algorithm to detect defects on the wafer, wherein the area of the wafer comprises an entire area of the wafer that will be scanned using an inspection recipe, and wherein the scan is performed without user intervention; selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the one or more parameters of the detection algorithm; and storing information for the portion of the defects, wherein the information comprises values for the one or more parameters of the detection algorithm determined for the defects in the portion, and wherein the information can be used to select the values for the one or more parameters of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan. - View Dependent Claims (2, 3, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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- 4. The method of 1, further comprising generating a multi-dimensional histogram for values for two or more of the parameters of the detection algorithm determined for defects detected during an initial scan performed prior to performing the scan and determining one or more parameters to be used for said selecting based on the multi-dimensional histogram, total number of the defects detected by the initial scan, the predetermined maximum number of the total defects to be used for selecting the values for the one or more parameters of the detection algorithm, the entire area of the wafer that will be scanned using the inspection recipe, and an area of the wafer scanned during the initial scan.
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19. A non-transitory computer-readable medium containing computer instructions stored therein for causing a computer system to perform a method for generating information to be used for selecting values for one or more parameters of a detection algorithm, wherein the method comprises:
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performing a scan of an area of a wafer using an inspection system and default values for one or more parameters of a detection algorithm to detect defects on the wafer, wherein the area of the wafer comprises an entire area of the wafer that will be scanned using an inspection recipe, and wherein the scan is performed without user intervention; selecting a portion of the defects from results of the scan based on a predetermined maximum number of total defects to be used for selecting values for the one or more parameters of the detection algorithm; and storing information for the portion of the defects, wherein the information comprises values for the one or more parameters oldie detection algorithm determined for the defects in the portion, and wherein the information can be used to select the values for the one or more parameters of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
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20. A system configured to generate information to be used for selecting values for one or more parameters of a detection algorithm, comprising:
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an inspection system configured to perform a scan of an area of a wafer using default values for one or more parameters of a detection algorithm to detect defects on the wafer, wherein the area of the wafer comprises an entire area of the wafer that will be scanned using an inspection recipe, and wherein the scan is performed without user intervention; and a computer system configured to; select a portion of the defects from results of the scan based on a predetermined, maximum number of total defects to be used for selecting values for the one or more parameters of the detection algorithm; and store information for the portion of the defects, wherein the information comprises values for the one or more parameters of the detection algorithm determined for the defects in the portion, and wherein the information can be used to select the values for the one or more parameters of the detection algorithm to be used for the inspection recipe without performing an additional scan of the wafer subsequent to the scan.
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Specification