Conditioning chamber for metallurgical surface science

• US 8,001,853 B2
• Filed: 11/02/2007
• Issued: 08/23/2011
• Est. Priority Date: 09/30/2002
• Status: Expired due to Fees

• Current Assignee: Her Majesty The Queen In Right Of Canada (Government of Canada)
• Original Assignee: Her Majesty The Queen In Right Of Canada (Government of Canada)
• Inventors: Pratt, Allen
• Primary Examiner(s): Raevis; Robert R
• Application Number:
  US11/979,461
• Publication Number:
  US 20080173108A1
• Time in Patent Office: 1,390 Days
• Field of Search: None
• US Class Current: 73/863
• CPC Class Codes: G01N 1/286 involving mechanical work, e.g. chopping, disintegrating, compacting, homogenising microtomes G01N1/06; pulverising in general B02C; mixing in general B01F
• CPC Class Codes: G01N 1/32 Polishing; Etching
• CPC Class Codes: G01N 2001/2873 Cutting or cleaving
• CPC Class Codes: G01N 33/204 Structure thereof, e.g. crystal structure

Abstract

The present invention provides a conditioning chamber device and a conditioning method for metallurgical samples which can be directly connected to an instrument having an examination chamber operable in an ultra high vacuum (UHV) condition at a selected pressure below 10⁻⁷ Torr. The conditioning chamber comprises at least one vacuum pump means to reduce the conditioning chamber to the selected UHV condition corresponding to the selected pressure of the examination chamber; sample retaining means; at least one fracturing means to prepare an analysis surface on the sample; sample drying means for slow drying the sample in the selected UHV condition; a sealable outlet constructed and arranged to be operatively connected to the inlet of the examination chamber; and transporting means to transport the sample after surface preparation through a connecting means into the examination chamber without leaving the selected ultra high vacuum condition.

Claims

1. A conditioning chamber device for metallurgical samples, constructed and arranged to be operatively connected to an instrument having an examination chamber operable in an ultra high vacuum condition at a selected pressure below 10 ⁻

7 Torr and having a sealable inlet, the conditioning chamber comprising

(i) at least one vacuum pump means constructed and arranged to reduce the conditioning chamber to a selected ultra high vacuum condition at a pressure below 10 <sup>−

7</sup> Torr and corresponding to the selected pressure of the examination chamber;

(ii) a sample retaining means;

(iii) at least one fracturing means constructed and arranged to prepare on a sample a surface suitable for metallurgical analysis;

(iv) a drying means constructed and arranged for slow drying of the sample in the selected ultra high vacuum condition;

(v) a sealable outlet comprising connecting means selectively operatively connected to the inlet of the examination chamber; and

(vi) a transporting means to transport the sample after surface preparation through a connecting means directly into the inlet of the examination chamber without leaving the selected ultra high vacuum condition.

2. A conditioning chamber device as claimed in claim 1 wherein the sample retaining means comprises a pedestal constructed and arranged to releasably secure a sample holder.

3. A conditioning chamber device as claimed in claim 2 wherein the transporting means comprises a transporter rod attached to the pedestal, and wherein movement of the transporter rod is regulated by an external control means.

4. A conditioning chamber device as claimed in claim 3 wherein the external control means comprises magnetic coupling.

5. A conditioning chamber device as claimed in claim 2, wherein the sample holder is a sample platen constructed and arranged to accommodate samples which are in a slurry condition.

6. A conditioning chamber device as claimed in claim 2, wherein the sample retaining means further comprises at least one gripping means constructed and arranged to retain the pedestal in at least one preselected position.

7. A conditioning chamber device as claimed in claim 1, wherein the vacuum pump means comprises a low vacuum roughing pump, a turbomolecular pump and an ion pump.

8. A conditioning chamber device as claimed in claim 7, wherein the low vacuum roughing pump is selected from a rotary vane pump, a dry scroll pump and a diaphragm pump.

9. A conditioning chamber device as claimed in claim 7, wherein the ion pump is selected from a triode ion pump, a diode ion pump and a star cell ion pump.

10. A conditioning chamber device as claimed in claim 1 wherein the fracturing means comprises a pair of chisels operable from substantially opposed directions in relation to each other.

11. A conditioning chamber device as claimed in claim 10 wherein each of the chisels has a cutting edge of tempered steel.

12. A conditioning chamber device as claimed in claim 1 wherein the transporting means comprises a transporter rod operatively secured to the sample retaining means, and wherein movement of the transporter rod is regulated by an external control means.

13. A conditioning chamber device as claimed in claim 12 wherein the external control means comprises magnetic coupling.

14. A conditioning chamber device as claimed in claim 12, wherein the sample retaining means comprises a gripping means and the transporter rod is permanently secured to the gripping means.

15. A method of conditioning a metallurgical sample for surface analysis by the steps of

(i) providing a conditioning chamber device operatively and sealably connectable to an instrument having an examination chamber operable in an ultra high vacuum condition at a selected pressure below 10 ⁻

7 Torr;

(ii) securing the sample within the conditioning chamber;

(iii) reducing the conditioning chamber to a selected ultra high vacuum condition corresponding with the selected pressure of the examination chamber;

(iv) drying the sample;

(v) fracturing the sample by a fracturing means to prepare a surface suitable for metallurgical analysis; and

(vi) sealably connecting the conditioning chamber to an inlet of the examination chamber and transporting the sample by a transporting means from the conditioning chamber directly into the examination chamber without leaving the selected ultra high vacuum condition.

16. A method as claimed in claim 15, wherein step (ii) comprises securing the sample on a sample supporting means, said sample supporting means being secured by a gripping means.

17. A method as claimed in claim 15, wherein step (iii) is performed by a low vacuum roughing pump, a turbomolecular pump and an ion pump.

18. A method as claimed in claim 15, wherein step (v) is performed by a pair of chisels operable from substantially opposed directions in relation to each other.

19. A method as claimed in claim 15, wherein step (vi) is performed by a transporter rod attached to the sample retaining means, and movement of the transporter rod is regulated by an external control means.

20. A method as claimed in claim 19, wherein the external control means comprises magnetic coupling.

21. A method as claimed in claim 16, wherein step (vi) is performed by a transporter rod attached to the gripping means, and movement of the transporter rod is regulated by an external control means.

22. A method as claimed in claim 21, wherein the external control means comprises magnetic coupling.