Lithographic apparatus and device manufacturing method for writing a digital image

• US 8,003,308 B2
• Filed: 05/06/2010
• Issued: 08/23/2011
• Est. Priority Date: 06/08/2005
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Van Groos, Pieter Johannes Marius
• Primary Examiner(s): Duda; Kathleen
• Assistant Examiner(s): Sullivan; Caleen O
• Application Number:
  US12/775,073
• Publication Number:
  US 20100209856A1
• Time in Patent Office: 474 Days
• Field of Search: 430/394, 430/313, 430/321, 430/320, 430/319, 430/311, 430/397
• US Class Current: 430/321
• CPC Class Codes: G03F 7/70283 Mask effects on the imaging process
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70358 Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
• CPC Class Codes: G03F 7/70475 Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

A device manufacturing method is provided. The method includes generating a first patterned beam, projecting the first patterned beam onto a substrate to form a first plurality of spot exposures on the substrate, scanning the substrate in a direction while projecting the first patterned beam, generating a second patterned beam, projecting the second patterned beam onto the substrate to form a second plurality of spot exposures on the substrate, and alternating spot exposures of the first plurality of spot exposures with respective spot exposures of the second plurality of spot exposures.

Claims

1. A device manufacturing method, comprising:

generating a first patterned beam with a first print head;

projecting the first patterned beam onto a substrate to form a first plurality of spot exposures on the substrate;

scanning the substrate in a direction while projecting the first patterned beam;

generating a second patterned beam with a second print head;

projecting the second patterned beam onto the substrate to form a second plurality of spot exposures on the substrate; and

alternating spot exposures of the first plurality of spot exposures with respective spot exposures of the second plurality of spot exposures.

2. The method of claim 1, further comprising:

establishing the direction as a first direction; and

extending at least one of the first and second plurality of radiation spots substantially across the width of the substrate in a second direction that is perpendicular to the first direction.

3. The method of claim 1, further comprising:

using a first array of laser or light emitting diodes to perform the generating the first patterned beam; and

using a second array of laser or light emitting diodes to perform the generating the second patterned beam.

4. The method of claim 1, further comprising:

establishing the direction as a first direction; and

the alternating comprising alternating spot exposures of the first plurality of spot exposures with respective spot exposures of the second plurality of spot exposures in a second direction that is perpendicular to the first direction.

5. The method of claim 1, wherein the alternating comprises alternating spot exposures of the first plurality of spot exposures with respective spot exposures of the second plurality of spot exposures in the direction.

6. A device manufacturing method, comprising:

generating a first patterned beam with each of a plurality of print heads;

projecting the first patterned beam onto a substrate to generate a first plurality of spot exposures on the substrate;

scanning the substrate in a first direction while projecting the plurality of radiation spots;

shifting the substrate relative to the projection of the patterned beam in a second direction perpendicular to the first direction;

generating a second patterned beam with each of the plurality of print heads;

projecting the second patterned beam onto the substrate to generate a second plurality of spot exposures on the substrate; and

alternating spot exposures of the second plurality of spot exposures with respective spot exposures of the first plurality of spot exposures.

7. The method of claim 6, further comprising:

extending at least one of the first and second plurality of radiation, spots substantially across a width of the substrate in the second direction.

8. The method of claim 6, further comprising:

using an array of laser diodes or an array of light emitting diodes to perform the generating of the first and second patterned beams.

9. The method of claim 6, wherein the alternating comprises alternating spot exposures of the second plurality of spot exposures with respective spot exposures of the first plurality of spot exposures in the second direction.

10. The method of claim 6, wherein the alternating comprises alternating spot exposures of the second plurality of spot exposures with respective spot exposures of the first plurality of spot exposures in the first direction.

11. A method for manufacturing a flat panel display, comprising:

generating a first patterned beam with each of a first plurality of print heads;

projecting the first patterned beam onto a substrate to generate a first plurality of spot exposures on the substrate;

scanning the substrate in a first direction while projecting the plurality of radiation spots;

shifting the substrate relative to the projection of the patterned beam in a second direction perpendicular to the first direction;

generating a second patterned beam with each of a second plurality of print heads;

projecting the second patterned beam onto the substrate to generate a second plurality of spot exposures on the substrate; and

alternating spot exposures of the second plurality of spot exposures with respective spot exposures of the first plurality of spot exposures.