Multilayer circuit devices and manufacturing methods using electroplated sacrificial structures
First Claim
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1. A method for forming a multilayer circuit device, comprising:
- providing a base substrate;
forming at least one conductor on the base substrate;
electroplating at least one sacrificial structure on at least a portion of at least one of the base substrate and conductors to define areas to be protected from deposition of a predetermined material;
depositing a thin film of the predetermined material having a predetermined electrical or structural characteristic on at least a portion of the at least one electroplated sacrificial structure and at least a portion of at least one of the base substrate, and the at least one conductor; and
removing the electroplated sacrificial structures and, after removal of the electroplated sacrificial structures, removing the predetermined material deposited on the electroplated sacrificial structures, to leave a patterned deposited thin film of the predetermined material on at least one of the conductors and the base substrate.
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Abstract
A multilayer circuit includes a dielectric base substrate, conductors formed on the base substrate and a vacuum deposited dielectric thin film formed over the conductors and the base substrate. The vacuum deposited dielectric thin film is patterned using sacrificial structures formed by electroplating techniques. Substrates formed in this manner enable significant increases in circuit pattern miniaturization, circuit pattern reliability, interconnect density and significant reduction of over-all substrate thickness.
75 Citations
32 Claims
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1. A method for forming a multilayer circuit device, comprising:
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providing a base substrate; forming at least one conductor on the base substrate; electroplating at least one sacrificial structure on at least a portion of at least one of the base substrate and conductors to define areas to be protected from deposition of a predetermined material; depositing a thin film of the predetermined material having a predetermined electrical or structural characteristic on at least a portion of the at least one electroplated sacrificial structure and at least a portion of at least one of the base substrate, and the at least one conductor; and removing the electroplated sacrificial structures and, after removal of the electroplated sacrificial structures, removing the predetermined material deposited on the electroplated sacrificial structures, to leave a patterned deposited thin film of the predetermined material on at least one of the conductors and the base substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 27, 29)
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15. A method for forming a multilayer circuit device, comprising:
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providing a base substrate having at least one conductor supported thereon; electroplating at least one sacrificial structure on at least one of the base substrate and the at least one conductor; depositing a film of a dielectric material on at least a first portion of the at least one electroplated sacrificial structure and over at least a portion of at least one of the base substrate, and the at least one conductor; and removing the electroplated sacrificial structures including the first portion of the at least one electroplated sacrificial structure and, after removal of the electroplated sacrificial structures, removing the dielectric material that had been deposited on the first portion of the at least one electroplated sacrificial structure, to leave a patterned deposited film of the dielectric material on at least a portion of at least one of the conductors and the base substrate. - View Dependent Claims (16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 28, 30, 32)
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31. A method for forming a multilayer circuit device, the method comprising:
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providing a base substrate having a surface generally extending along an x-y plane and at least one conductor supported on the surface; electroplating at least one sacrificial structure on at least one of the base substrate surface and the at least one conductor; and after producing a dielectric layer in a first pattern by depositing and at least partially supporting a film of a dielectric material on a surface of at least a portion of the at least one electroplated sacrificial structure and over at least a portion of at least one of the base substrate surface and the at least one conductor, producing a second pattern of the dielectric layer by removing both the at least one electroplated sacrificial structure and the portion of the dielectric material film of the first pattern deposited and supported on the surface of the at least one electroplated sacrificial structure, wherein the second pattern of the dielectric layer is geometrically different from the first pattern of the dielectric layer with respect to at least one direction in the x-y plane.
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Specification